31 results about "Vacuum ultraviolet spectroscopy" patented technology

A spectroscopy system is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. The system may further include the use of an array detector in combination with an imaging spectrometer. In this manner data for multiple wavelengths may be simultaneously collected. Moreover, the multiple wavelengths of data may be collected simultaneously for a two dimensional sample area. The system may further include the use of a fixed diffraction grating and does not require the use of polarizing elements. To ensure accurate and repeatable measurement, the environment of the optical path is controlled. The optical path may include a controlled environmental chamber in which non-absorbing purge gases are present or in which vacuum evacuation techniques are utilized. The controlled environment may further include a separate instrument chamber and a separate sample chamber. The controlled environment limits in a repeatable manner the absorption of VUV photons.

A spectroscopy system is provided which operates in the vacuum ultraviolet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical path is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard. Referencing is particularly advantageous in the VUV reflectometer due to the low available photon flux and the sensitivity of recorded data to the composition of the gaseous medium contained with the optical path. Thus, errors that may be introduced by changes in the controlled environment may be reduced. In one exemplary embodiment, the VUV reflectometer may utilize a technique in which a beam splitter is utilized to create a sample beam and a reference beam to form the two arms of a near balanced Mach Zehnder interferometer. In another exemplary embodiment, the reference channel may be comprised of a Michelson interferometer.

A vacuum ultraviolet hemisphere reflectivity testing device belongs to the field of vacuum ultraviolet spectrum transmission testing and comprises a deuterium lamp light source, a toroid mirror, a Seya-Namioka monochrometer, an alignment reflector, a photochopper, a fluorescent integrating sphere coated with a fluorescent conversion film on the inner wall, a sample, a diffuse transmission light filter, a detector, an accurate rotary table, a wavelength driving mechanism, a data collection system, a computer and a vacuum tank. All optical elements of the testing device are of reflection structures, a light division system adopts the Seya-Namioka monochrometer, a IV type phase difference elimination concave face grating with large numerical is adopted at a light division element of the monochrometer, and efficient transmission of vacuum ultraviolet spectrum energy is guaranteed. A receiving system of the detector adopts the scheme of the fluorescent integrating sphere, thereby avoiding excess energy loss after vacuum ultraviolet beams are reflected mangy times on the inner wall of the integrating sphere. By means of two working models (sample/reference), absolute measurement of the vacuum ultraviolet hemisphere reflectivity is achieved.

The invention provides a vacuum ultraviolet spectroscopy detecting device, which belongs to the field of spectrum analysis. The device includes: an entrance slit (2), a concave grating (3), a optical fiber array (4) and a flat plate detector (5). The entrance slit (2) and concave grating (3) are fixed in the vacuum cavity (1), one head face of the optical fiber array (4) coincides with the Rowland circle determined by the entrance slit (2) and the concave grating (3). The head face of the optical fiber array (4) is painted with fluorescent substance which can transform vacuum ultraviolet light into visible light, the other end face bifurcates into a number of sub-optical fiber arrays, and the end face of the sub-optical fiber array is a plain face and is connected with one flat plate detector (5). The device can measure vacuum ultraviolet spectroscopy within a certain range of wavelength simultaneously, and achieve the optical spectrum and pixel resolution of glancing incidence grating vacuum ultraviolet spectrometer, the testing time responses well and the device has high sensitivity; the moveable component is not needed in the vacuum cavity, and the structure is simple and reliable.

The invention relates to a method and a device for calibrating vacuum ultraviolet spectral radiometers. The method comprises spectral radiant luminance responsivity calibration, spectral radiant irradiance responsivity calibration and/or wavelength accuracy calibration, which are conducted in an oil-free vacuum chamber. The device comprises a spectral radiant luminance responsivity calibration mechanism, a spectral radiant irradiance responsivity calibration mechanism, and a wavelength accuracy calibration mechanism. There is no calibration device suitable for vacuum ultraviolet spectral radiometers in our country at present. By using the method and the device for calibrating vacuum ultraviolet spectral radiometers of the invention, the multiple parameters of a vacuum ultraviolet spectral radiometer can be calibrated in a ground laboratory before emission, and therefore, the accuracy of data acquired by the vacuum ultraviolet spectral radiometer is guaranteed. The method and the device are of great significance to the acquisition of spectral information of the sun, the earth surface and other sun-earth space environments.

A spectroscopy system (500) is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical paths (506, 508) is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard.

A method for determining a set of grating parameters for producing a diffraction grating for a vacuum-ultraviolet spectrometer, the parameters used being the small and large radius of the toroidal grating substrate, the two distances between the two holographic illumination points and the grating origin, the angular position of the holographic illumination points in relation to the grating normal, and the laser wavelength for the holographic illumination. The method determines respective optimum grating parameters on numeric iterative paths for a specific problem definition. The method thus advantageously enables the production of a VUV spectrometer having a diffraction grating that for a predetermined wavelength range produces a minimum line width on the detector with a large range.

The invention discloses an adjusting method for a vacuum ultraviolet plane grating dispersion spectrograph and belongs to the technical field of spectrographs. The adjusting method is used for solving the problem that precision is lowered when the vacuum ultraviolet grating spectrograph is adjusted. According to the adjusting method, an interferometer serves as the light source, a plane mirror is used for replacing a vacuum ultraviolet grating in an original light path, and a system wave aberration interferogram is used for sequentially adjusting a telescoping system, a collimation system and a slot of the spectrograph; afterwards, a visible light grating is used for replacing the plane mirror, collimation light of a parallel mercury lamp characteristic spectrum built through a mercury lamp and the collimation system serves as the adjusting light source, an image surface ideal spectrum chart of the system under the vacuum ultraviolet waveband is calculated, the vacuum ultraviolet wavelength corresponding to the mercury lamp characteristic spectrum is calculated according to the groove density of the visible light grating for replacement and the vacuum ultraviolet grating of the vacuum ultraviolet spectrograph to be adjusted, the positions of all vacuum ultraviolet spectrum lines corresponding to the mercury lamp characteristic spectrum on an image surface are recorded, the light grating and a focusing mirror are adjusted in sequence, and the positions of mercury lamp characteristic spectrum lines fall on the optimal positions obtained through calculation.

The invention belongs to the technical field of semiconductor lighting devices, and specifically relates to a vacuum ultraviolet LED junction temperature and ultraviolet radiation measuring system based on an integrating sphere. The measuring system comprises an external bearing sphere which can be pumped to a low-vacuum state, an internal integrating sphere which can be pumped to a high-vacuum state, a constant temperature device, a measuring circuit, and a driving circuit. The bearing sphere and the integrating sphere are electrically connected by an aviation plug. The side wall of the internal integrating sphere is equipped with a standard lamp, a vacuum ultraviolet power meter probe and a vacuum ultraviolet spectrometer, and can measure the radiation flux and the spectrum of a vacuum ultraviolet LED. The constant temperature device is connected with a temperature feedback system and a computer control system, and can control the temperature accurately and quickly. The advantage lies in that the parameters of a vacuum ultraviolet LED, such as spectral power distribution, radiation flux, electric power, thermal power and junction temperature, can be measured simultaneously under constant junction temperature, and test is highly repeatable.

The invention discloses a metal nanowire detector and method for measuring vacuum ultraviolet intensity. By means of the metal nanowire detector and method for measuring the vacuum ultraviolet intensity, a vacuum ultraviolet spectral signal is absolutely measured. The detector is composed of a multihole anodised alumina template with nanometer holes, and single substance metal on which single substance metal nanowires can grow is deposited inside the nanometer holes of the multihole anodised alumina template. The detector is used for measuring the 30-250eV ultraviolet signal intensity under the vacuum environment. The measuring method comprises the steps that a copper ring sheet serves as a positive electrode, the metal nanowire detector serves as a negative electrode, an insulating washer is inserted between the copper ring sheet and the metal nanowire detector, the negative electrode is connected with a current meter in series, and a DC stabilized power supply which can provide positive voltage or back bias voltage for the positive electrode and the negative electrode is additionally arranged in a measuring loop; the metal nanowire detector is demarcated through a transmission standard detector; the demarcated detector is placed at a corresponding position in the light intensity signal measuring light path layout; a light path system is started to provide the positive voltage or the back bias voltage for the positive electrode and the negative electrode; the light intensity signal is measured based on the full electron yield method, measuring is efficient, and the signal is stable.

The invention relates to the technical field of ultraviolet irradiance measurement, in particular to a method and a system for standardization of vacuum ultraviolet spectrum irradiance. The method includes obtaining ultraviolet spectrum irradiance luminance L (lambada) of an ultraviolet source with the wavelength range of 115nm-400nm; obtaining the ultraviolet spectrum irradiance E (lambada) of the ultraviolet source with the wavelength range of 250nm-400nm; obtaining a light source solid angle omega with the wavelength range of 250nm-400nm by utilizing the omega=E (lambada)/L (lambada); obtaining the light source solid angle omega 1 with the wavelength range of 115nm-250nm according to the light source solid angle omega with the wavelength range of 250nm-400nm; and obtaining the ultraviolet spectrum irradiance luminance E 1 (lambada) with the wavelength range of 115nm-250nm according to the formula E I (lambada) = L (lambada) *omega I. By the aid of the method, the problem that lower limit wavelength of the vacuum ultraviolet spectrum irradiance fails to reach 250nm below is solved.

The invention discloses a method for detecting attenuation resistance characteristic of fluorescent powder. The method comprises the following steps: adding water into the fluorescent powder, mixing so as to obtain a mixture, slurrying the mixture, heating, drying, dispersing, sieving, stimulating by a vacuum ultraviolet spectrum analyzer and qualitatively judging the strength of the attenuation resistance characteristic of the fluorescent powder according to the brightness retention rate before and after the slurrying of the powder.

The invention relates to the technical field of designs for optical systems, in particular to an optical system for calibrating vacuum ultraviolet spectral parameters. When the optical system is used for calibrating vacuum ultraviolet relative spectral response ratios of detectors, ultraviolet light with a specific wave band within a 110-400nm wave band range is turned into parallel light by specific collimating lenses of a plurality of collimating lenses, and the parallel light is transmitted to the detectors; and when the optical system is used for calibrating vacuum ultraviolet spectral irradiance of light, the ultraviolet light with a specific wave band within a 110-400nm wave band range is converged by specific converging lenses of a plurality of converging lenses after the ultraviolet light is transmitted through diffusers, the converged light is outputted to a standard detector, and the ultraviolet light with the specific wave band is equalized by the specific diffusers. The optical system in an embodiment of the invention has the advantages that seven lens materials, the wave band ranges and performance parameters of the optical system are reasonably matched with one another by a combined type design method, the cost is lowered, and the structure of the system is simplified.

The invention relates to an apparatus comprising a spectrometer, means for the spatially-resolving conversion into charge of light exiting the spectrometer, an integrator circuit for the spatially-resolving integration of the charge, as well as means for displaying the charge that is integrated dependent on the position. The integrator circuit is assembled from discrete components. Thus, the transport of plasma impurities can be properly measured.

An apparatus and method are presented for use in optical processing of an article. The apparatus comprises: one or more optical windows for directing predetermined electromagnetic radiation therethrough to illuminate a region of interest and collecting radiation returned from the illuminated region; and two or more ports operable for inputting or discharging one or more gases from the vicinity of the region of interest on the article being processed to create in the vicinity of said region a substantially static state of environment, non-absorbable for said electromagnetic radiation, thereby reducing amount of ambient gas in the vicinity of said region of interest and enabling optical processing of the article while maintaining it in the ambient gas environment.