31 results about "Vacuum ultraviolet spectroscopy" patented technology

A spectroscopy system is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. The system may further include the use of an array detector in combination with an imaging spectrometer. In this manner data for multiple wavelengths may be simultaneously collected. Moreover, the multiple wavelengths of data may be collected simultaneously for a two dimensional sample area. The system may further include the use of a fixed diffraction grating and does not require the use of polarizing elements. To ensure accurate and repeatable measurement, the environment of the optical path is controlled. The optical path may include a controlled environmental chamber in which non-absorbing purge gases are present or in which vacuum evacuation techniques are utilized. The controlled environment may further include a separate instrument chamber and a separate sample chamber. The controlled environment limits in a repeatable manner the absorption of VUV photons.

A spectroscopy system is provided which operates in the vacuum ultraviolet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical path is controlled to limit absorption effects of gases that may be present in the optical path. The VUV reflectometer may be utilized to monitor a wide range of data in a semiconductor processing environment. For example, the techniques may be used for measuring thicknesses, optical properties, composition, porosity and roughness of a film or stack of films. Further, the VUV techniques and apparatus may be used to characterize critical dimensions and other features of a device. The VUV reflectometer system may be utilized as a stand alone tool, or the relatively compact nature of the system may be taken advantage of such that the system is incorporated into other process tools. Thus, for example, the VUV techniques described herein may be incorporated directly into tools used for deposition, etch, photolithography, etc. so that in-line measurements, monitoring and control may be advantageously obtained.

A spectroscopy system is provided which operates in the vacuum ultraviolet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical path is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard. Referencing is particularly advantageous in the VUV reflectometer due to the low available photon flux and the sensitivity of recorded data to the composition of the gaseous medium contained with the optical path. Thus, errors that may be introduced by changes in the controlled environment may be reduced. In one exemplary embodiment, the VUV reflectometer may utilize a technique in which a beam splitter is utilized to create a sample beam and a reference beam to form the two arms of a near balanced Mach Zehnder interferometer. In another exemplary embodiment, the reference channel may be comprised of a Michelson interferometer.

An apparatus and method are presented for use in optical processing of an article. The apparatus comprises: one or more optical windows for directing predetermined electromagnetic radiation therethrough to illuminate a region of interest and collecting radiation returned from the illuminated region; and two or more ports operable for inputting or discharging one or more gases from the vicinity of the region of interest on the article being processed to create in the vicinity of said region a substantially static state of environment, non-absorbable for said electromagnetic radiation, thereby reducing amount of ambient gas in the vicinity of said region of interest and enabling optical processing of the article while maintaining it in the ambient gas environment.

An apparatus for measuring the transport time of impurity particles in a plasma includes a spectrometer, a system for the spatially-resolving conversion into charge of light exiting the spectrometer, an integrator circuit for the spatially-resolving integration of the charge, as well as a display screen that presents the integrated charge as a series of spectral lines. The integrator circuit is assembled from discrete components. Thus, the transport of plasma impurities can be properly measured.

The invention provides a vacuum ultraviolet spectroscopy detecting device, which belongs to the field of spectrum analysis. The device includes: an entrance slit (2), a concave grating (3), a opticalfiber array (4) and a flat plate detector (5). The entrance slit (2) and concave grating (3) are fixed in the vacuum cavity (1), one head face of the optical fiber array (4) coincides with the Rowlandcircle determined by the entrance slit (2) and the concave grating (3). The head face of the optical fiber array (4) is painted with fluorescent substance which can transform vacuum ultraviolet lightinto visible light, the other end face bifurcates into a number of sub-optical fiber arrays, and the end face of the sub-optical fiber array is a plain face and is connected with one flat plate detector (5). The device can measure vacuum ultraviolet spectroscopy within a certain range of wavelength simultaneously, and achieve the optical spectrum and pixel resolution of glancing incidence gratingvacuum ultraviolet spectrometer, the testing time responses well and the device has high sensitivity; the moveable component is not needed in the vacuum cavity, and the structure is simple and reliable.

A vacuum ultraviolet hemisphere reflectivity testing device belongs to the field of vacuum ultraviolet spectrum transmission testing and comprises a deuterium lamp light source, a toroid mirror, a Seya-Namioka monochrometer, an alignment reflector, a photochopper, a fluorescent integrating sphere coated with a fluorescent conversion film on the inner wall, a sample, a diffuse transmission light filter, a detector, an accurate rotary table, a wavelength driving mechanism, a data collection system, a computer and a vacuum tank. All optical elements of the testing device are of reflection structures, a light division system adopts the Seya-Namioka monochrometer, a IV type phase difference elimination concave face grating with large numerical is adopted at a light division element of the monochrometer, and efficient transmission of vacuum ultraviolet spectrum energy is guaranteed. A receiving system of the detector adopts the scheme of the fluorescent integrating sphere, thereby avoiding excess energy loss after vacuum ultraviolet beams are reflected mangy times on the inner wall of the integrating sphere. By means of two working models (sample / reference), absolute measurement of the vacuum ultraviolet hemisphere reflectivity is achieved.

The invention relates to the technical field of designs for optical systems, in particular to an optical system for calibrating vacuum ultraviolet spectral parameters. When the optical system is used for calibrating vacuum ultraviolet relative spectral response ratios of detectors, ultraviolet light with a specific wave band within a 110-400nm wave band range is turned into parallel light by specific collimating lenses of a plurality of collimating lenses, and the parallel light is transmitted to the detectors; and when the optical system is used for calibrating vacuum ultraviolet spectral irradiance of light, the ultraviolet light with a specific wave band within a 110-400nm wave band range is converged by specific converging lenses of a plurality of converging lenses after the ultraviolet light is transmitted through diffusers, the converged light is outputted to a standard detector, and the ultraviolet light with the specific wave band is equalized by the specific diffusers. The optical system in an embodiment of the invention has the advantages that seven lens materials, the wave band ranges and performance parameters of the optical system are reasonably matched with one another by a combined type design method, the cost is lowered, and the structure of the system is simplified.

The method for installing and adjusting the vacuum ultraviolet grating dispersion spectrometer belongs to the field of spectrum technology. In order to solve the problem that the accuracy of the vacuum ultraviolet grating spectrometer is lowered during the installation and adjustment, the method uses an interferometer as a light source, and uses a plane mirror to carry out the vacuum ultraviolet grating in the original optical path. Instead, adjust the telescopic system, collimation system and slit of the spectrometer in sequence through the system wave aberration interferogram; then replace the plane mirror with a visible light grating, and use the mercury lamp and collimation system to build the characteristic spectral collimation of the parallel mercury lamp Light is the light source for installation and adjustment, calculate the ideal spectrum of the image plane of the system in the vacuum ultraviolet band, and calculate the characteristics of the corresponding mercury lamp according to the ratio of the reticle density of the replaced visible light grating to the vacuum ultraviolet grating of the vacuum ultraviolet spectrometer to be adjusted The vacuum ultraviolet wavelength of the spectrum, record the position of each vacuum ultraviolet spectral line corresponding to the characteristic spectrum of the mercury lamp on the image plane, and adjust the grating and focusing mirror in turn, so that the position of the characteristic spectral line of the mercury lamp falls to the best position obtained by calculation superior.

The invention discloses a metal nanowire detector and method for measuring vacuum ultraviolet intensity. By means of the metal nanowire detector and method for measuring the vacuum ultraviolet intensity, a vacuum ultraviolet spectral signal is absolutely measured. The detector is composed of a multihole anodised alumina template with nanometer holes, and single substance metal on which single substance metal nanowires can grow is deposited inside the nanometer holes of the multihole anodised alumina template. The detector is used for measuring the 30-250eV ultraviolet signal intensity under the vacuum environment. The measuring method comprises the steps that a copper ring sheet serves as a positive electrode, the metal nanowire detector serves as a negative electrode, an insulating washer is inserted between the copper ring sheet and the metal nanowire detector, the negative electrode is connected with a current meter in series, and a DC stabilized power supply which can provide positive voltage or back bias voltage for the positive electrode and the negative electrode is additionally arranged in a measuring loop; the metal nanowire detector is demarcated through a transmission standard detector; the demarcated detector is placed at a corresponding position in the light intensity signal measuring light path layout; a light path system is started to provide the positive voltage or the back bias voltage for the positive electrode and the negative electrode; the light intensity signal is measured based on the full electron yield method, measuring is efficient, and the signal is stable.

A spectroscopy system (500) is provided which operates in the vacuum ultra-violet spectrum. More particularly, a system utilizing reflectometry techniques in the vacuum ultraviolet spectrum is provided for use in metrology applications. To ensure accurate and repeatable measurement, the environment of the optical paths (506, 508) is controlled to limit absorption effects of gases that may be present in the optical path. To account for absorption effects that may still occur, the length of the optical path is minimized. To further account for absorption effects, the reflectance data may be referenced to a relative standard.