Method for manufacturing color filter with pixel end difference height improved through half tone mask

A half-tone mask and high-level technology, which is applied in the field of display filter production, can solve problems such as poor liquid crystal alignment, uneven PI friction, light leakage at the edge of pixels, etc., and achieve simple manufacturing process, improve production efficiency, and save work flow Effect

Inactive Publication Date: 2015-01-14
南京中电熊猫液晶材料科技有限公司
View PDF4 Cites 12 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The present invention proposes a color filter manufacturing method that uses a half-tone mask to improve the edge height of pixels. Its purpose is to solve the PI friction caused b

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for manufacturing color filter with pixel end difference height improved through half tone mask
  • Method for manufacturing color filter with pixel end difference height improved through half tone mask
  • Method for manufacturing color filter with pixel end difference height improved through half tone mask

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0042] Example

[0043] The following combines specific embodiments and Figure 3a~Figure 3c A detailed introduction to the manufacturing method of this description.

[0044] The present invention specifically uses a halftone mask to form a special convex shape on the edges of the black matrix, and then the color layers are sequentially formed on the substrate. Specifically include the following process steps:

[0045] 1) Such as Figure 3a As shown, a black matrix material layer 301 is coated on the substrate 300;

[0046] 2) Such as Figure 3b As shown, a halftone mask 302 (partially with different transmission functions) is used to expose the coated black matrix material layer 301 to form a completely removed area, a partially retained area, and a completely retained area on the substrate 300, of which some remain Areas are the first and third areas, the second part is completely reserved area, and the fourth part is completely removed area;

[0047] 3) Such as Figure 3c As shown...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a method for manufacturing a color filter with the pixel end difference height improved through a half tone mask. The method comprises the steps that firstly, a substrate is coated with a black matrix material; secondly, exposing, developing and high-temperature baking and solidifying are carried out on the material through the half tone mask, four areas are formed, T-shaped black matrix patterns with the height difference are formed in the first area, the second area and the third area and are reserved on the substrate; thirdly, the four areas of the substrate are coated with color films; fourthly, exposing, developing and solidifying are carried out on the color films so that a needed color film pattern can be formed, wherein the needed color film pattern is located on the first area, the third area and the fourth area, and the operation is repeatedly carried out three times; fifthly, a transparent conductive layer ITO is splashed after all color film layers are formed; sixthly, the substrate is coated with a transparent insulation material layer; seventhly, the substrate is wholly exposed, developed and solidified, and a PS layer with the needed height is formed and serves as a common column for supporting Gaps between two LCD substrate layers. The method has the advantages that the material does not need to be changed, the production efficiency is improved, and the production procedures are simplified.

Description

technical field [0001] The invention relates to a method for manufacturing a color filter by using a half tone mask (Half Tone Mask) to improve the height of pixel end difference (horn) and belongs to the technical field of display filter production. Background technique [0002] The structure of the color filter (Colour Filter) includes a glass substrate, a black matrix, a color layer, an ITO conductive film layer, and a PS layer. In order to prevent light leakage between the color pixel and the underlying black matrix BM, there is an appropriate amount of overlap between the color pixel and the black matrix BM during design, that is, Overlay, where the photoresist amount is more than other parts of the pixel, and the height is also higher than other parts of the pixel , usually called end difference (ox horn), such as figure 1 As shown, TN products have very high requirements for the end difference (horn) on the pixel. If the end difference (horn) is high, it will affect ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G02B5/20G03F1/32G02F1/1335
CPCG02B5/286G02F1/133516G03F1/32G02F1/133521
Inventor 甄娟彭建中任慧郭景雷志刚尹翠芳
Owner 南京中电熊猫液晶材料科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap