The invention discloses a method for manufacturing a color filter with the pixel end difference height improved through a half tone
mask. The method comprises the steps that firstly, a substrate is coated with a
black matrix material; secondly, exposing, developing and high-temperature baking and solidifying are carried out on the material through the half tone
mask, four areas are formed, T-shaped
black matrix patterns with the
height difference are formed in the first area, the second area and the third area and are reserved on the substrate; thirdly, the four areas of the substrate are coated with color films; fourthly, exposing, developing and solidifying are carried out on the color films so that a needed
color film pattern can be formed, wherein the needed
color film pattern is located on the first area, the third area and the fourth area, and the operation is repeatedly carried out three times; fifthly, a transparent conductive layer ITO is splashed after all
color film layers are formed; sixthly, the substrate is coated with a transparent insulation material layer; seventhly, the substrate is wholly exposed, developed and solidified, and a PS layer with the needed height is formed and serves as a common column for supporting Gaps between two LCD substrate
layers. The method has the advantages that the material does not need to be changed, the production efficiency is improved, and the production procedures are simplified.