Pixel structure, display panel and production method of pixel structure
A technology of pixel structure and manufacturing method, applied in nonlinear optics, instruments, optics, etc., can solve the problems of reducing panel light transmittance, occupying pixel aperture ratio, etc., so as to reduce parasitic capacitance, increase aperture ratio, and reduce area area. Effect
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[0084] In order to describe the first embodiment of the present invention in detail, the manufacturing steps described in detail are as follows:
[0085] Step 1: If Figure 5 As shown, on a substrate such as glass, the structure of the first metal layer such as the scanning line 31, the horizontal common electrode lines 32, 32', and the storage electrode 41 is formed at the same time. And cover the gate insulation layer on the first metal layer. Figure 6 for Figure 5 The cross-sectional view of the middle pixel structure along the A5-A5' direction. Such as Figure 6 As shown, the pattern of the first metal layer such as the scan line 31 and the storage electrode 41 is distributed on the substrate such as glass, and the gate insulating layer 63 is covered on the pattern of the first metal layer.
[0086] Step 2: If Figure 7 As shown, a semiconductor active layer pattern 43 is formed above the gate insulating layer, and the semiconductor material may be amorphous silicon...
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