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Transparent conductive film having bending resistance, and method for manufacturing same

A technology of transparent conductive film and transparent conductive layer, which is applied in the direction of conductive layer, circuit, electrical components, etc. The effect of bending resistance

Inactive Publication Date: 2015-02-25
LG HAUSYS LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, until now, there has been little concrete research on the structure of the base film and hard coat layer used to produce a transparent conductive film for improving the bending resistance of transparent conductivity.
In addition, although Japanese Patent Laid-Open Publication No. 1998-114159 describes the structure of a transparent conductive film including a base film and a hard coat layer, this is only for ensuring the prescribed hardness and durability of the transparent conductive film, and does not describe it. In any structure that ensures bending resistance, the problem of the conventional transparent conductive film that exhibits a large resistance change range against bending still appears

Method used

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  • Transparent conductive film having bending resistance, and method for manufacturing same
  • Transparent conductive film having bending resistance, and method for manufacturing same
  • Transparent conductive film having bending resistance, and method for manufacturing same

Examples

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preparation example Construction

[0050] Preparation method of transparent conductive film

[0051] An example of the present invention provides a preparation method of a transparent conductive film, the preparation method of the transparent conductive film includes the following steps: a step of forming a hard coat layer on both sides of the transparent substrate; and on the above hard coat layer, by The step of forming a transparent conductive layer by sputtering method.

[0052] In the step of forming a hard coat layer on both sides of the above-mentioned transparent substrate, the formation method of the hard coat layer can be realized by a common coating method, for example, bar coating (bar coating), blade coating (blade coating). , spin coating, gravure coating and spray coating, etc.

[0053] In the step of forming the transparent conductive layer on the hard coat layer, the method for forming the transparent conductive layer is not particularly limited, and conventionally known methods can be selecte...

Embodiment 1

[0059] As a hard coat forming material, 5 parts by weight of a photopolymerization initiator is added to 100 parts by weight of an acrylic polyurethane resin (UNIDIC 17-806 manufactured by Nippon Ink Chemicals Co., Ltd.). Hydroxycyclohexyl phenyl ketone (IRGACURE 184 manufactured by Chiba Specialty Chemicals Co., Ltd.), a toluene solution diluted at a concentration of 30% by weight was prepared.

[0060] This hard coat layer forming material was applied to both sides of a transparent substrate formed of a polyethylene terephthalate (PET) film having a thickness of 125 μm, and dried at 100° C. for 3 minutes. After that, immediately use an ozone-type high-pressure mercury lamp (energy density of 80W / cm 2 , 15cm spotlight type) 2 lamps to implement ultraviolet radiation to form a hard coating.

[0061] Then, in an atmosphere of 0.4 Pa formed by 98% argon and 2% oxygen, the above-mentioned hard coating was applied by a reactive sputtering method using a sintered body material of ...

Embodiment 2 to Embodiment 4

[0063] In Examples 2 to 4, except that the thicknesses of the above-mentioned hard coat layers formed on the upper and lower portions of the polyethylene terephthalate (PET) film were 2.5 μm, 3.1 μm, 5.3 μm, and 7.2 μm, respectively Except that, a transparent conductive film was prepared by the same method as in Example 1.

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Abstract

Provided is a transparent conductive film which includes: a transparent base material; hard coating layers formed on either surface of the transparent base material; and at least one transparent conductive layer formed on the hard coating layer. Also provided is a method for manufacturing the transparent conductive film, which includes: a step of forming hard coating layers on either surface of the transparent base material; and a step of forming the transparent conductive layer on the hard coating layer using a sputtering method.

Description

technical field [0001] The present invention relates to a transparent conductive film having bending resistance, and more particularly, to a transparent conductive film in which the thickness of a hard coat layer is limited in order to ensure the bending resistance of the transparent conductive film and a preparation method thereof. Background technique [0002] At present, most of the transparent conductive films used in the touch screen panel industry are prepared by electrostatic capacitance, and usually the electrical and optical properties of the transparent conductive films are mainly considered. However, in order to realize the flexible displays that will be used in the future, all components used should have durability for bending resistance, and the same goes for transparent conductive films. [0003] However, until now, almost no specific studies have been conducted on the structure of the base film and the hard coat layer used for the production of the transparent...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01B5/14
CPCH01L51/0097H01L51/5215G06F3/041G06F2203/04103G06F2203/04102H10K77/111H01B5/14H10K50/816G06F3/0412
Inventor 郑根金仁淑赵靖金庚泽金冻应沈熙埈崔圣玹
Owner LG HAUSYS LTD