Method for preparing columnar ceramic coating layer by low-pressure plasma spraying based on liquid phase filtration
A low-pressure plasma and ceramic coating technology, which is applied in coating, metal material coating process, fusion spraying, etc., can solve the problem that it is difficult to realize PS-PVD to prepare columnar structure ceramic coating, and achieve the requirements of materials with less restrictions Effect
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Embodiment 1
[0034] With zirconia as the matrix, it is processed into a disc sample of Φ18×2mm. Use acetone and alcohol to ultrasonically clean the sample in sequence, use diamond sandpaper to polish the surface of the sample, and finally use alcohol to clean the surface of the sample; use a plasma spray gun with circulating water to cool the buncher cover, and use it under 100Pa ambient pressure , using 7-8wt.% YSZ powder for PS-PVD process to prepare YSZ coating, wherein the spraying parameters are spraying rated power 45kW, Ar 40L / min, H 2 8L / min, spraying distance 260-420mm, powder feeding rate 3g / min, depositing method is to place a columnar blocking device in front of the substrate, and the spray gun does not move during the spraying process. The cross-sectional structure of the coating (such as image 3 (a) to image 3 Shown in (c)) appears as a columnar structure.
Embodiment 2
[0036]With zirconia as the matrix, it is processed into a disc sample of Φ18×2mm. Use acetone and alcohol to ultrasonically clean the sample in sequence, use diamond sandpaper to polish the surface of the sample, and finally use alcohol to clean the surface of the sample; use a plasma spray gun with circulating water to cool the buncher cover, and use it under 100Pa ambient pressure , using 7-8wt.% YSZ powder for PS-PVD process to prepare YSZ coating, wherein the spraying parameters are spraying rated power 60kW, Ar 50L / min, H 2 10L / min, spraying distance 260-420mm, powder feeding rate 3g / min, deposition method is to place a louver-type shielding device in front of the substrate, and the spray gun does not move during the spraying process. The cross-sectional structure of the coating (such as Figure 4 (a) to Figure 4 Shown in (c)) appears as a columnar structure.
Embodiment 3
[0038] With zirconia as the matrix, it is processed into a disc sample of Φ18×2mm. Use acetone and alcohol to ultrasonically clean the sample in sequence, use diamond sandpaper to polish the surface of the sample, and finally use alcohol to clean the surface of the sample; use a plasma spray gun with circulating water to cool the buncher cover, and use it under 100Pa ambient pressure , using 7-8wt.% YSZ powder for PS-PVD process to prepare YSZ coating, wherein the spraying parameters are spraying rated power 78kW, Ar 70L / min, H 2 15L / min, spraying distance 260-420mm, powder feeding volume 3g / min, the deposition method is to place a louver-type shielding device in front of the substrate, and the spray gun does not move during the spraying process. The cross-sectional structure of the coating (such as Figure 5 (a) to Figure 5 Shown in (c)) appears as a columnar structure.
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