Manganese-titanium co-doped indium fluosilicate luminescent film as well as preparation method and application thereof
A technology of indium fluorosilicate, light-emitting thin film, applied in the directions of light-emitting materials, chemical instruments and methods, semiconductor devices, etc.
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[0036] The preparation method of the manganese-titanium co-doped indium fluorosilicate luminescent film comprises the following steps:
[0037] S11. According to MeIn 2 Si 2 f 16 :xMn 4+ ,yTi 4+ The stoichiometric ratio of each element is weighed in MeF 2 , InF 3 , SiF 4 , MnF 4 and TiF 4 The powder is mixed evenly and sintered at 900°C to 1300°C to make a target.
[0038] Wherein, 0.01≤x≤0.05, 0.01≤y≤0.08, Me is Mg, Ca, Sr or Ba. Preferably, x is 0.02 and y is 0.04.
[0039] Of course, MeF can also be weighed according to the molar ratio 1:2:2:x:y 2 , InF 3 , SiF 4 , MnF 4 and TiF 4 Powder.
[0040] Preferably, the MeF 2 , InF 3 , SiF 4 , MnF 4 and TiF 4 The powder is mixed evenly and sintered at 1250°C to make a target.
[0041] Preferably, the manufactured target is cylindrical, with a diameter of 50mm and a thickness of 2mm.
[0042] S12. Put the target and the substrate into the vacuum chamber of the magnetron sputtering coating equipment, and adjus...
Embodiment 1
[0085] Choose MgF 2 , InF 3 , SiF 4 , MnF 4 and TiF 4 The powders, respectively 1mmol, 2mmol, 2mmol, 0.02mmol, 0.04mmol, were uniformly mixed and then sintered at 1250°C to form a ceramic target with a diameter of 50mm and a thickness of 2mm, and the target was loaded into a vacuum chamber. Then, the glass substrate with ITO was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate is set to 60mm. Use a mechanical pump and a molecular pump to pump the vacuum of the cavity to 5.0×10 -4 Pa, the working gas flow rate of argon is 25 sccm, the pressure is adjusted to 2.0 Pa, and the substrate temperature is 500°C. By controlling the magnetron sputtering time to 20min, a luminescent film with a thickness of 240nm was obtained, annealed in a 0.01Pa vacuum furnace for 2h, and the annealing temperature was 600°C, and the chemical formula ...
Embodiment 2
[0089] Choose MgF 2 , InF 3 , SiF 4 , MnF 4 and TiF 4 Powders, respectively 1mmol, 2mmol, 2mmol, 0.01mmol, 0.01mmol, after uniform mixing, sintered at 900°C to form a ceramic target with a diameter of 50mm and a thickness of 2mm, and put the target into a vacuum chamber. Then, the glass substrate with ITO was ultrasonically cleaned with acetone, absolute ethanol and deionized water successively, treated with oxygen plasma, and placed in a vacuum chamber. The distance between the target and the substrate was set to 45mm. Use a mechanical pump and a molecular pump to evacuate the vacuum of the chamber to 1.0×10 -3 Pa, the working gas flow rate of argon is 10 sccm, the pressure is adjusted to 0.2 Pa, and the substrate temperature is 250°C. By controlling the time of magnetron sputtering to 10min, a luminescent film with a thickness of 40nm is obtained, annealed in a 0.001Pa vacuum furnace for 1h, and the annealing temperature is 500°C, and the chemical formula is MgIn 2 Si...
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