Electrothermal film board production method and device

Abstract

The invention provides an electrothermal film board production method and device. The production method includes the following steps that (1) a substrate to be sprayed is provided; (2) the substrate is sequentially sent to a temperature rising region with the temperature ranging from 0 DEG C to 200 DEG C, a solid temperature region with the temperature ranging from 201 DEG C to 600 DEG C and a stabilizing region with the temperature ranging from 601 DEG C to 620 DEG C to be subjected to temperature adjusting; (3) the substrate is sent to a spraying region with the temperature ranging from 601 DEG C to 620 DEG C to be sprayed by electrothermal film processing liquid, at least one face of the substrate forms an electrothermal film, and a semi-finished product is obtained; (4) the semi-finished product is sent into a curing region to cure the electrothermal film; (5) cooling is conducted, and a finished product is obtained. According to the method, stepwise temperature adjusting is conducted on the substrate before spraying, spraying is conducted after the temperature of the substrate is even, the connection performance of the formed electrothermal film and the substrate is good, the thickness of the film is even, the surface is smooth, and the defects of blistering and irregularity are avoided; one-time spraying is enough, the production efficiency is high, and moving type spraying is adopted, so that spraying is comprehensive, and the film layer is even.

Description

technical field [0001] The invention relates to a production method and production equipment of an electrothermal film plate, belonging to the technical field of heating devices. Background technique [0002] Nano electrothermal film plate is an electric heating element formed by spraying electrothermal film liquid on a high temperature resistant insulating carrier under high temperature conditions. The insulating carrier is generally glass ceramics, ceramics, etc. When the nano electric heating plate is working, it can effectively emit far-infrared rays of 5.6um-15um, accounting for more than 90% of the overall wavelength. The thermal efficiency of up to 98% makes the nano-electric heating film heating plate second to none in the heating field. There is no redness or burning phenomenon during use, stable physical and chemical properties, thermal stability, acid and alkali resistance, and good wear resistance. The melting point of the heating film itself is as high as 1000°...

AI Technical Summary

Problems solved by technology

Its disadvantage is that the maximum working temperature is only 450°C, and the application range is relatively narrow, and the substrate is directly placed in a 600-800°C furnace for heating and spraying during the manufacturing process of this electrothermal film, and the internal temperature of the substrate during spraying is difficult. It is consistent with the external temperature, which affects the quality of film formation. It is easy to have uneven film thickness, unevenness, and foaming. low efficiency

Images