Mounting and adjusting device of extreme ultraviolet reflection lens

Abstract

The invention discloses a mounting and adjusting device of an extreme ultraviolet reflection lens. The mounting and adjusting device is used for mounting and adjusting the lens (2) and comprises a cavity (1), a lens supporting frame (3), embracing and pressing systems (4) and supporting systems (5), a through hole is formed in the bottom wall of the cavity, the lens supporting frame is positioned in the cavity and used for supporting the lens, the embracing and pressing systems are used for fixing the lens on the lens supporting frame, the supporting systems penetrate into the cavity through the through hole of the cavity, a portion, positioned in the cavity, of each supporting system is fixedly connected with the bottom of the lens supporting frame, each supporting system comprises an upper flange, a lower flange, a corrugated pipe and a supporting screw, each upper flange and the corresponding lower flange are fixedly connected with two ends of the corresponding corrugated pipe respectively, axially aligned and provided with through holes in the centers, and the supporting screws sequentially penetrate the through hole of the cavity and the through holes in the centers of the lower flanges, the corrugated pipes and the upper flanges to be abutted against the bottom of the lens supporting frame. By the mounting and adjusting device, three-dimensional adjusting of the lens and the lens supporting frame can be realized, and vibration influence, on the lens, of a vacuum air pump is isolated.

Description

technical field [0001] The invention belongs to the technical field of extreme ultraviolet (EUV) lithography, and in particular relates to a lens assembly and adjustment device, in particular to an EUV reflective lens assembly and adjustment device. Background technique [0002] EUV lithography technology is the next-generation lithography machine technology after 193nm immersion lithography technology. Since EUV radiation is strongly absorbed by almost all substances (including air), the EUV lithography machine system must be placed in a vacuum environment. The vacuum pump group is used to realize this vacuum environment, so that the chamber meets the vacuum degree requirements. [0003] In addition, the optical system of the EUV lithography machine is a reflective optical system. In a closed vacuum environment, in addition to requiring stable installation and reliable adjustment, it is also necessary to eliminate various external disturbances (such as the vibration of the ...

AI Technical Summary

Problems solved by technology

[0004] A damping bellows can be installed between the vacuum pump group and the vacuum chamber to reduce the vibration effect of the vacuum pump group on the vacuum chamber, thereby reducing the vibration effect on the mirror; Increasing the length of the bellows will increase the suction flow resistance and increase the loss of pumping speed, which will lead to the adverse results of the reduction of the effective pumping speed of the pump and the increase of the pumping time

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