External roll-to-plane micro-nano lithography imprinting light source device

Abstract

The invention discloses an external roll-to-plane micro-nano imprinting lithography light source device which comprises an ultraviolet lamp light source arranged outside a roll mold and a control circuit capable of controlling the change in illumination intensity of the light source, wherein the ultraviolet lamp light source comprises a paraboloid-type lampshade, an ultraviolet lamp tube, a convex lens column, an ultraviolet lamp tube position regulating unit, a convex lens column position regulating unit and an ultraviolet lamp light source angle regulating unit; the light intensity control part comprises an incremental photoelectric encoder, a phase detection and amplification circuit and an ultraviolet lamp tube, and is capable of changing illumination intensity along with the change in a roll-imprinting rate; and by virtue of the ultraviolet lamp light source angle regulating unit, the ultraviolet lamp tube position regulating unit and the convex lens column position regulating unit, a tangent line of the surface of the roll mold and a substrate is parallel with the focal line of the convex lens column by regulating, the closer the better, but the light of the ultraviolet lamp light source cannot fall on the surface of the roll-imprinting mold. According to the light source device disclosed by the invention, the roll is manufactured to be small and precise, and the processing precision of the mold and the processing quality of workpiece patterns are improved.

Description

technical field [0001] The invention belongs to the micro-nano manufacturing technology, in particular to an external roll-to-plane micro-nano photolithographic imprint light source device. Background technique [0002] Currently, in lithography imprinting technology, immersion lithography and extreme ultraviolet lithography have been promoted in order to increase the applicable range of the mold in the imprinting device and to increase the feature density in a given substrate area, but they The prices are quite expensive. [0003] Lithographic imprinting, the imprinting of a pattern from an imprint template onto a substrate, is economical and reliable, and enables smaller geometric features. The advantage of this technique is that the density of the features on the imprint template determines its resolution, independent of the emission wavelength of the radiation source or the aperture size of the projection system. [0004] The Chinese patent (application number: 2014101...

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Problems solved by technology

[0005] In this patent application, the ultraviolet light source structure is placed inside the narrow drum, which makes the whole device very complicated and difficult to dissipate heat, resulting in thermal expansion and contraction deformation of the drum and the mold, which seriously affects the processing accuracy, and also affects the strength of the mold material, Higher requirements have been put forward for wear resistance and light transmittance, which are difficult to achieve

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