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Low refractive index film, curable composition for forming low refractive index film, optical member, and solid-state imaging device using same

A technology of curable composition and low-refractive index film, which can be used in optical components, optics, electrical components, etc., can solve the problem of wafer size becoming larger, and achieve the effect of improving optical performance, coating, and excellent optical performance.

Active Publication Date: 2015-05-20
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, in order to manufacture more devices in a single production, the size of the wafer used is also increased

Method used

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  • Low refractive index film, curable composition for forming low refractive index film, optical member, and solid-state imaging device using same
  • Low refractive index film, curable composition for forming low refractive index film, optical member, and solid-state imaging device using same
  • Low refractive index film, curable composition for forming low refractive index film, optical member, and solid-state imaging device using same

Examples

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Embodiment

[0698] The following examples are given to further describe the present invention in detail, but the present invention should not be limitedly interpreted by these examples. In addition, "part" and "%" in this Example are mass standards unless otherwise specified.

[0699]

[0700] (Synthesis of Hydrolyzed Condensate)

[0701] A preparation example of composition A02 is shown as a representative example. The hydrolysis and condensation reaction was carried out using methyltriethoxysilane. The solvent used at this time was ethanol. The obtained hydrolysis-condensation product A-1 had a weight average molecular weight of about 10,000. In addition, the said weight average molecular weight was confirmed by GPC according to the procedure demonstrated previously. The components of the following composition 1 were mixed with the mixer, and the composition A02 was prepared. Other compositions were prepared similarly to A02 except having used the components of the quantity shown...

Embodiment 2

[0800] (High refractive index material composition without titanium dioxide)

[0801] In order to form a layer having a refractive index (1.68), the following compositions were prepared. Moreover, when using the following composition C01, prebaking (100 degreeC 2min) and postbaking (230 degreeC 10min) were implemented and the cured film was formed.

[0802] Solvent: Propylene Glycol Monomethyl Ether Acetate …15 parts

[0803] Cyclohexanone …30 parts

[0804] Resin: Nissan Chemical Industry Co., Ltd. ultra-high refractive index coating material UR202 32 parts

[0805] Curing accelerator: SB-A (Mitsubishi Gas Chemical Company, Inc.) ... 5 parts

[0806] Epoxy resin: 157S65 (manufactured by Mitsubishi Chemical Corporation) ... 17.5 parts

[0807] Surfactant: Megafac F-781 (DIC) …0.5 parts

[0808] Using this high-refractive-index material C01, the aforementioned antireflection low-refractive-index film was formed as shown in Table 2 below. In all tests, it was confirmed tha...

Embodiment 3

[0812] A test body 301 was obtained in the same manner as in the test body 201 except that UR202 of the high refractive index material C01 of the test body 201 was changed to a thioepoxy resin LPH1101 (manufactured by Mitsubishi Gas Chemical Company, Inc.). About the test body 301, the reflectance in the range of 450-650 nm was evaluated similarly to the test body 101, and the favorable result was confirmed.

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Abstract

Provided is a low refractive index film having an Abbe number of 5-40 and a refractive index of 1.3-1.5.

Description

technical field [0001] The present invention relates to a low-refractive-index film, a curable composition for forming a low-refractive-index film, an optical component, and a solid-state imaging device using the same. Background technique [0002] Recently, there are various types of optical devices, and most of them have a structure in which an anti-reflection low-refractive index film is formed on the surface of an optical mechanism. The optical mechanism is not limited to a mechanism with a flat surface, and examples include a brightness-enhancing lens or a diffusion lens for a liquid crystal backlight, a Fresnel lens or a lenticular lens for a screen of a video projection TV, or a microlens, etc. . With such a device, by forming a fine structure mainly using a resin material, desired geometrical optical properties can be obtained. In this device, in order to further impart antireflection properties, a low-refractive-index film may be formed in a form suitable for the ...

Claims

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Application Information

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IPC IPC(8): G02B1/111C08L27/12C08L83/04G02B1/11H01L27/14H01L27/146
CPCG02B1/111C08K2003/2241C09D183/04G02B2207/107
Inventor 山本启之岛田和人
Owner FUJIFILM CORP
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