Electrowetting substrate, manufacturing method thereof and electrowetting display device
A manufacturing method and electrowetting technology, applied in the field of electrowetting, can solve the problem of low surface energy of the hydrophobic layer, and achieve the effects of improving service life, reducing manufacturing process, and stabilizing performance
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[0029] refer to figure 1 , the manufacturing method of the electrowetting substrate 2 with the pixel wall structure of the present invention comprises the following steps:
[0030] 1) Clean the conductive plate 21.
[0031] The conductive plate 21 can be a traditional conductive glass substrate, such as an ITO glass substrate, or a conductive flexible substrate, such as a PET substrate; the cleaned conductive plate 21 is dried at <120° C. for use.
[0032] 2) Deposit the insulating layer 22 .
[0033] This step is an optional step, which is selected according to the requirements of the electrowetting device for insulation performance.
[0034] The insulating layer 22 material can be silicon nitride (Si 3 N 4 ), silicon dioxide or Parylene, etc., wherein Parylene can be any of Parylene C, Parylene D, Parylene N, Parylene HT and other series products; LP-CVD (low pressure chemical vapor deposition) technology can be used at a relatively high Use vertical or horizontal tube ...
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