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Manufacturing method of filter grating for removing scattered x-rays

A manufacturing method and line absorption technology, which are applied in the fields of radiation diagnostic diaphragms, echo tomography, radiation/particle processing, etc., can solve problems such as difficulty in maintaining mechanical strength and large aspect ratio, and achieve high throughput and high resolution. and excellent mechanical strength

Inactive Publication Date: 2017-12-08
FUJIKIN INC
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0011] However, in Problem 2, since the structural strength of the air-filter grating is logically dependent on the structural strength of the X-ray absorbing part, if the problem 1 is to be solved, the X-ray receiving surface (incident The size (area) (S2) of the surface) decreases and the aspect ratio increases, making it difficult to maintain mechanical strength (Problem 3)

Method used

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  • Manufacturing method of filter grating for removing scattered x-rays
  • Manufacturing method of filter grating for removing scattered x-rays
  • Manufacturing method of filter grating for removing scattered x-rays

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Embodiment Construction

[0113] Hereinafter, the present invention will be specifically and described in detail by citing its embodiments, but the present invention is not limited to these specific examples, and extended or extended examples are also included as long as it is based on the essence of the present invention. That is, the present invention is not limited to the above-described embodiments or modifications, and it goes without saying that various modifications, design changes, and the like that do not depart from the scope of the technical idea of ​​the present invention are included in the technical scope thereof.

[0114] Figure 1A It shows a schematic enlarged upper part view for explaining one of preferable examples of the filter grating for removing scattered X-rays manufactured by the manufacturing method of the present invention.

[0115] Figure 1B expressed in Figure 1A In the case where the part indicated by the dashed-dotted line X1-X2 is cut, it is a schematic enlarged cut-aw...

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Abstract

The present invention aims to provide a manufacturing method of a filtering grating for scattered X-ray removal, which can easily and inexpensively manufacture primary X-rays with excellent transmissison characteristics. The method comprises a run-through pattern forming process of forming a primary processing substrate provided with a run-through pattern of a plurality of hexagonal unit run-through parts H at specific intervals by illuminating synchronous acceleration light beams to a resin substrate GS; and an electroless plating processing process of forming electroless plating layers on surfaces and reverse faces of connection parts B among the unit run-through parts H and inner faces of the unit run-through parts H by impregnating the primary processing substrate into an electroless plating solution containing a metal (Au) with X-ray absorptivity.

Description

technical field [0001] The present invention relates to a filter grid for removing scattered X-rays used in X-ray image processing apparatuses (X-ray image handling apparatuses) such as analog / digital X-ray imaging devices or X-ray CT devices, mammography, and CR manufacturing method. Background technique [0002] In the X-ray image processing apparatus, X-rays radiated in a direction independent of the incident X-rays (primary X-rays) transmitted through the subject, so-called scattered X-rays (secondary X-rays), cause the contrast of the imaging screen In many cases, a reduction in sharpness or sharpness becomes an obstacle to an accurate diagnosis. To remove the scattered X-rays, devices called anti-scatter grids for removing scattered X-rays (hereinafter sometimes simply referred to as “filter grids”) are used. [0003] The filter grid for removing scattered X-rays has an X-ray-absorbing part made of a material with high X-ray absorption (lead, tungsten, etc.) and an X...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G21K3/00
CPCG21K1/10A61B6/06G21K1/025
Inventor 胜见雪人町井芳文长谷川惠一长谷川博恒吉原丰吉田政人佐藤秀信
Owner FUJIKIN INC
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