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Automatic growth control method of sapphire (80-150 kg) monocrystalline

An automatic growth and control method technology, which is applied in the directions of single crystal growth, single crystal growth, crystal growth, etc., can solve the problems such as the movement of the main heat dissipation area of ​​the growth surface, and achieve the prevention of crystal cracking, the reduction of axial temperature gradient, and the power slow down effect

Inactive Publication Date: 2015-07-15
内蒙古京晶光电科技有限公司
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The object of the present invention is to provide a kind of automatic growth control method of 80-150kg sapphire single crystal, which solves the problem that sapphire single crystal growth cannot be achieved in the main cooling area of ​​the thermal field. The problem of moving the main heat dissipation area with the growth surface

Method used

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Embodiment

[0011] Embodiment: the specific technical process of this embodiment is as follows:

[0012] Load aluminum oxide 120kg (purity 99.996%), melt the material, complete the seeding, enter the automatic control stage, set the proportional factor R (upper heater power deceleration / lower heater power deceleration): automatic control initial R 1 Value set at 10; automatic control ends R 2 The value is set at 0.125; the automatic control time T is set at 210h. Turn on the automatic control, and the PLC calculates the total power deceleration suitable for crystal growth to be 120w / h through the crystal weight and growth rate signals. Since R=10, the power deceleration of the upper and lower heaters is 109w / h and 11w / h respectively , at this time the growth surface is located in the temperature control area of ​​the upper heater, which is suitable for crystal growth; the automatic control runs for 250 hours, R=0.125, the total power deceleration calculated by PLC is 243w / h, and the powe...

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Abstract

The invention relates to a sapphire monocrystalline growth control method, and especially relates to an automatic growth control method of sapphire (80-150 kg) monocrystalline. The provided method solve the problem that sapphire cannot move along with the growth face main heat-dissipation zone in the thermal field main cooling area during the growth period. A two-section thermal field is utilized, the initial value and final value of R namely the upper heater / lower heater power decreasing speed ratio factor, and the automatic control time (T) are set, and the ratio factor R satisfies the formula: R(T)=Acos([pi]T / 600)+B through the PLC computation control during a predetermined time (T), and gradually changes from R1 to R2. By automatically controlling the upper heater / lower heater power decreasing speed ratio factor, the main heat-dissipation zone of a thermal filed can be adjusted to perfectly cooperate the movement of the crystal growth face, at the same time, the temperature gradient is modulated to adapt to the crystal growth, thus the crystal yield is high, and the crystal qualified rate is high. Because the main heat-dissipation zone always cooperates with the crystallization latent heat generating zone, the heat dissipation is successful, and the growth period is greatly reduced.

Description

technical field [0001] The invention relates to a gem single crystal growth control method, in particular to an automatic growth control method of 80-150kg gem single crystal. Background technique [0002] Kyropoulos growth of sapphire single crystal is a widely used sapphire growth method because of its low cost and excellent crystal quality, which is highly recognized in the industry. [0003] When growing a sapphire single crystal by the Kyropoulos method, the solid-liquid interface forms a convex growth surface during the growth process. The growth surface will continuously generate crystallization latent heat due to supercooled crystallization. If the crystallization latent heat can be dissipated smoothly, the crystal will continue to grow at a certain rate. , if the latent heat of crystallization fails to dissipate smoothly, it will increase the local temperature, slow down or prevent the continuous growth of the crystal, and at the same time, due to the crystal growth...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B17/00C30B29/20
Inventor 罗仁辉秦英谡马中琦杨明超
Owner 内蒙古京晶光电科技有限公司
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