Unlock instant, AI-driven research and patent intelligence for your innovation.

A sub-wavelength reflective one-dimensional metal wave plate and its preparation method

A reflective, sub-wavelength technology, applied in diffraction gratings, optics, instruments, etc., can solve problems such as complex process, difficult metal etching, and difficult production, and achieve wide source of raw materials, high application value, and low time cost Effect

Inactive Publication Date: 2017-09-22
SUZHOU UNIV
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the difficulty of metal etching, the above-mentioned structures have the problems of complicated process and difficult fabrication.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A sub-wavelength reflective one-dimensional metal wave plate and its preparation method
  • A sub-wavelength reflective one-dimensional metal wave plate and its preparation method
  • A sub-wavelength reflective one-dimensional metal wave plate and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] See attached figure 2 , The dielectric grating material in this embodiment is SiO 2 , Period P=300nm, dielectric grating thickness H1=100nm, duty ratio W / P=0.5, metal aluminum layer grating thickness H1+H2=140nm. The structure can be regarded as a half-wave plate in the 514nm-536nm band, and the ellipticity is within 0.08; at the same time, the structure can be regarded as a quarter-wave plate in the range of 676nm-704nm, and the ellipticity is in the range of 0.87-0.91 , When the polarization incident angle of linear polarization is 45 degrees, the average reflectivity is above 80%.

[0036] See attached image 3 , Is the above-mentioned sub-wavelength reflective one-dimensional metal wave plate in the 0.4um ~ 1um waveband, the reflected light in the two orthogonal directions of the component Ex, Ey phase difference and amplitude ratio trend chart; from the phase difference curve we can see that the short The phase difference between the two orthogonal components of the ...

Embodiment 2

[0039] The dielectric grating material in this embodiment is MgF 2 , Period P=250nm, dielectric grating thickness H1=118nm, duty cycle W / P=0.4, metal aluminum layer grating thickness H1+H2=158nm. The structure can be regarded as a half-wave plate in the 511nm-549nm band, and the ellipticity is within 0.07; at the same time, the structure can be regarded as a quarter-wave plate in the range of 763nm-810nm, and the ellipticity is in the range of 0.88-0.90 , When the polarization incidence angle of linear polarization is 45 degrees, the average reflectivity is above 75%.

[0040] See attached Figure 5 , Is the trend chart of the phase difference and amplitude ratio of the sub-wavelength reflective one-dimensional metal wave plate in the 0.4um~1um waveband in the above example 2 in the two orthogonal directions components Ex and Ey; from the phase difference curve we can see In the short-wave band (0.4um), the phase difference between the two orthogonal components can reach 4.5rad. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a sub-wavelength reflective one-dimensional metal wave plate and its preparation method, which can realize the functions of half and quarter wave plates in different wavelength bands, and the wave plates include dielectric gratings and The metal layer arranged on it; the nano-dielectric grating structure is provided with a grating-like metal layer, the period of the dielectric grating is 80-350nm, the duty ratio is 0.3-0.8, and the thickness is 50-200nm. The thickness of the metal layer is higher than that of the dielectric The thickness of the grating is more than 30nm (layer spacing is greater than 30nm). The material of the dielectric layer can be SiO2, MgF2, PMMA, and the metal layer can be materials with high reflectivity such as gold, silver, aluminum, and cadmium. The invention has the advantages of simple structure, easy manufacture, etc., and has great application value in future optical sensing systems, advanced nanometer photonic devices and integrated optical systems.

Description

Technical field [0001] The invention relates to optical element preparation technology, in particular to a sub-wavelength reflection type one-dimensional metal wave plate and a preparation method thereof. Background technique [0002] In the field of light research and application, the generation and conversion control of the light polarization state is very important. Polarization is the property of the wave plate. Most of the traditional light polarization state generation and control devices use birefringent crystal materials. When light is incident on the birefringent crystal, the two orthogonal directions along the parallel and vertical optical axes have different Optical refractive index, so when light passes through a birefringent crystal, the transmitted light will have a phase difference in these two orthogonal directions, thereby changing the polarization state of the light. As an important optical device, traditional crystal waveplates are limited by physical size and...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/30G02B5/18
CPCG02B5/1876G02B5/3058
Inventor 王钦华胡敬佩李瑞彬赵效楠王淼陈玲华许富洋曹冰
Owner SUZHOU UNIV