Crystal blank grinding system

A technology for grinding and polishing blanks, which is applied to grinding/polishing equipment, grinding machines, spherical grinding machines, etc. It can solve the problems of low utilization rate, large machine size, multiple transitions and waiting for vacancies, etc., and achieves high machine utilization rate, The machine is small in size, reducing the effect of transition and waiting for vacancies

Active Publication Date: 2015-10-07
虞雅仙
View PDF12 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] 1. At the loading position of the loading and unloading machine and the docking position of the docking machine, because the clamp needs to cooperate with the loading plate or the upper and lower clamps in the feeding mechanism, it is required that the transfer manipulator can transfer the clamp to the accurate position to ensure the loading Accuracy or docking accuracy, which will undoubtedly increase the manufacturing cost, debugging and maintenance cost and transfer difficulty of the transfer manipulator. There are also unilateral positioning devices in the prior art, but they cannot guarantee the positioning accuracy of the fixture, nor can they adapt to each processing position. Individual Differences
[0006] 2. After the grinding and polishing process of the upper hemisphere or the lower hemisphere of the crystal blank is completed, there is a lack of a special quality inspection station for the quality inspection of grinding and polishing, and the fixture for bonding the crystal blank is set downward and is located inside the machine. It is also not convenient for manual quality inspection
[0007] 3. The grinding and polishing machine adopts a single abrasive tool sequence, and the front and rear grinding and polishing mechanisms share one grinding and polishing abrasive tool. Because the grinding and polishing positions of the upper and lower hemispheres do not correspond, there are many waiting spaces for transition, resulting in a large machine size and low utilization. low rate

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Crystal blank grinding system
  • Crystal blank grinding system
  • Crystal blank grinding system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0029] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0030] In describing the present invention, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " The orientations or positional relationships indicated by "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "clockwise", "counterclockwise" are based on the attached The orientation or positional relationship shown in the figure is only for the convenience of describing the present invention and simplifying the description...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a crystal blank grinding system. The crystal blank grinding system comprises a feeding station, a discharging station, a plurality of upper half ball grinding stations and an abutting station which are sequentially arranged from right to left along a first left-right transferring mechanism, and further comprises an abutting position, a plurality of lower half ball grinding stations, a feeding station and a discharging station which are sequentially arranged from left to right along a second left-right transferring mechanism. A grinding machine comprises an upper half ball grinding tool sequence and a lower half hall grinding sequence, a plurality of upper half ball grinding mechanisms are arranged left and right to form an upper half ball machining sequence, and circulation of clamps is achieved between the adjacent grinding mechanisms in the upper half ball machining sequence through the first left-right transferring mechanism; a plurality of lower half ball grinding mechanisms are arranged left and right to form a lower half ball machining sequence, and circulation of the clamps is achieved between the adjacent grinding mechanisms in the lower half ball machining sequence through the second left-right transferring mechanism. The upper half ball grinding tool sequence is located on the front side of the lower half ball grinding tool sequence. According to the crystal blank grinding system, the transition waiting vacancy is reduced, the size of a machine is small, and the machine utilization rate is high.

Description

technical field [0001] The invention belongs to the field of crystal product grinding and polishing, and relates to a crystal blank grinding and polishing system for automatic grinding and polishing of crystal blanks. Background technique [0002] The patent document with the publication number CN104647164A discloses an automatic grinding and polishing system for crystal blanks, which includes a first left-right transfer mechanism and a second left-right transfer mechanism arranged in front and back in parallel, arranged in sequence from right to left along the first left-right transfer mechanism There are loading and unloading stations, multiple upper hemisphere grinding and polishing stations and docking stations, and the docking stations, multiple lower hemisphere grinding and polishing stations, and loading and unloading stations are arranged in sequence from left to right along the second left and right transfer mechanisms ; Wherein, the loading and unloading station is...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24B11/02B24B41/00B24B41/06B24B41/02B24B27/00
CPCB24B11/02B24B27/0023B24B27/0076B24B41/005B24B41/02B24B41/06
Inventor 虞雅仙
Owner 虞雅仙
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products