Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Line information and non-line area information capturing method and line defect detecting method

A line information and non-line technology, which is applied in the fields of line information and non-line area information acquisition and line defect detection, can solve problems such as inability to accurately find HDI boards and IC substrates, defects, etc.

Active Publication Date: 2015-11-25
UTECHZONE CO LTD
View PDF6 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the existing printed circuit board integrated circuit manufacturing method, a conductor pattern is deposited on the printed circuit board to form it. In recent years, the development of printed circuit board technology has made the effective circuit layout space reach the limit. Density planning (the number of devices per square centimeter gradually increases), thin line and space planning of circuit board layout, increasing pitch density grid array devices, etc. Therefore, the formation of conductor patterns on printed circuit boards must be relatively miniaturized and the best layout should be planned Density, so it is easy to cause defects in the circuit on the printed circuit board, so it is often necessary to further inspect and test the circuit, but with the continuous improvement of production technology, the density and diversity of printed circuit boards are rapidly increasing. Defects on HDI boards and IC substrates cannot be accurately found by visual inspection. Therefore, automated machine vision inspection methods, such as Automated Optical Inspection (AOI) or Automatic Image Inspection (AVI), are used to detect printed circuit boards. Circuit defects on the board are quite common

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Line information and non-line area information capturing method and line defect detecting method
  • Line information and non-line area information capturing method and line defect detecting method
  • Line information and non-line area information capturing method and line defect detecting method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0054] Figure 1A Shows a flow chart of the first preferred embodiment of a method for capturing line information of the present invention, which includes the following steps a to b:

[0055] a) Process a computer-aided design picture (hereinafter referred to as CAM picture 2) into a skeleton picture 3.

[0056] b) Use skeleton image 3 to capture the line information of each line or specified line on a substrate (such as a printed circuit board) made according to CAM image 2, such as the color level or line width of each line or specified line And other information. The circuit referred to here generally refers to a conductor formed on the substrate, and is not limited to the form of a wire. For example, conductors in the form of metal pads (pads), solder balls, metal rings, metal pins, etc. are all covered.

[0057] The CAM picture 2 exemplified in step a is as figure 2 As shown, it includes a circuit pattern 20 (the white part in the figure) and a non-circuit pattern 21 (the black...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention mainly discloses a line information and non-line area information capturing method and a line defect detecting method. The line information capturing method comprises steps of processing a computer auxiliary designed picture into a skeleton picture, acquiring a circuit image, counterpointing the skeleton picture and the circuit image to enable each thin line of the skeleton of the skeleton picture to be corresponding to the interior of each line corresponding to the circuit image, and capturing line information of each line corresponding to the circuit image in the same coordinate position according to pixel point coordinate positions of each thin line of the skeleton, wherein the skeleton picture is provided with a skeleton formed by a plurality of thin lines; each thin line is a thin lined result of each line corresponding to the computer auxiliary designed picture; and the circuit image shoots according to a base plate manufactured based on the computer auxiliary designed picture.

Description

Technical field [0001] The present invention relates to a method for detecting or measuring circuits on substrates such as printed circuit boards, TFT panels, etc., in particular to a method that uses a skeleton to extract circuit images taken from the substrate and can be used for circuit defect detection or other applications. Method of application. Background technique [0002] In the existing printed circuit board integrated circuit manufacturing method, a conductor pattern is deposited on the printed circuit board. In recent years, the development of printed circuit board technology has brought the effective circuit layout space to the limit. For example, it is limited to the best circuit board. Density planning (the number of devices per square centimeter is gradually increasing), the fine line and space planning of the circuit board layout, the increase of spacing density grid array devices, etc., so the conductor pattern formed on the printed circuit board must be relativ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/956G01R31/02
Inventor 郑雅芸廖佐华陆家梁
Owner UTECHZONE CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products