Semi-floating gate device and formation method therefor
A semi-floating gate device and floating gate technology, applied in semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of unstable performance and poor reliability of semi-floating gate devices, and achieve increased contact area and improved performance effect
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[0037] As mentioned in the background, the semi-floating gate device formed in the prior art has unstable performance and poor reliability.
[0038] Please refer to figure 1 , figure 1 It is a schematic cross-sectional structure diagram of a semi-floating gate crystal device according to an embodiment of the present invention, including: a substrate 100 having a doped well region 101 within the doped well region 101 having first dopant ions A trench (not shown) located in the substrate 100, the bottom of the trench is lower than the bottom of the doped well region 101; a gate dielectric layer located on the sidewall and bottom surface of the trench 102, the top of the gate dielectric layer 102 is lower than the top of the trench; the first floating gate layer 103 on the surface of the gate dielectric layer 102 in the trench, the surface of the first floating gate layer 103 is in contact with the gate The top of the dielectric layer 102 is flush; the second floating gate laye...
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