Method for fabricating crystalline photovoltaic cells

A photovoltaic cell, crystal technology, used in photovoltaic power generation, final product manufacturing, sustainable manufacturing/processing, etc., can solve problems such as high thermal budget, achieve low thermal budget, reduce dopant redistribution, and reduce minority carrier lifetime the effect of shortening

Inactive Publication Date: 2016-03-16
INTERUNIVERSITAIR MICRO ELECTRONICS CENT (IMEC VZW)
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Classical thermal oxidation (dry or wet) yields high-quality surface passivation but requires a high thermal budget and oxidizes all exposed surfaces including the epitaxial layer surface

Method used

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  • Method for fabricating crystalline photovoltaic cells
  • Method for fabricating crystalline photovoltaic cells
  • Method for fabricating crystalline photovoltaic cells

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Embodiment Construction

[0034] In the following detailed description, numerous specific details are set forth in order to provide a thorough understanding of embodiments of the invention, and how the invention may be practiced in certain embodiments. It is understood, however, that the invention may be practiced without these specific details. In other instances, well-known methods, procedures and techniques have not been described in detail in order not to obscure the present invention.

[0035] The present invention will be described with respect to specific embodiments and with reference to certain drawings but the invention is not limited thereto but only by the claims. The drawings described are only schematic and not limiting. In the drawings, the size of some of the elements may be exaggerated and not drawn on scale for illustrative purposes. The dimensions and relative dimensions do not necessarily correspond to actual reductions to the practice of the invention.

[0036] Furthermore, the ...

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Abstract

A method is provided for fabricating a crystalline semiconductor photovoltaic cell, wherein the method comprises depositing a dielectric layer at first predetermined locations on a surface of a semiconductor substrate and growing a doped epitaxial layer at second predetermined locations on a surface of the semiconductor substrate, the second predetermined locations being different from and non-overlapping with the first predetermined locations. The dielectric layer is maintained as a surface passivation layer in the photovoltaic cell. The doped epitaxial layer forms an emitter region, a back surface field region or a front surface field region of the photovoltaic cell.

Description

technical field [0001] The present invention relates to methods for manufacturing crystalline photovoltaic cells, such as crystalline silicon photovoltaic cells. Background technique [0002] Epitaxial growth of highly doped regions is a promising technique for constructing the emitter, back surface field (BSF) and / or front surface field (FSF) regions of silicon photovoltaic cells. High throughput for epitaxial growth can be achieved by using eg LPCVD (low pressure chemical vapor deposition) systems, where silicon substrates or wafers are loaded into batch type substrate boats. In this high-throughput system, all substrate surfaces are exposed to the precursors used in the epitaxial growth process. Epitaxial growth is performed on all silicon surfaces exposed to the precursor. Thus, a masking step before epitaxy or a patterning step after epitaxy is required if localized epitaxial layer patterning is required or if the epitaxial layer is only to be provided on a single sub...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18
CPCH01L31/18H01L31/1868H01L31/02167H01L31/068H01L31/0682H01L31/1804Y02E10/547Y02P70/50
Inventor M·瑞卡曼帕尤F·迪林克斯M·阿莱曼
Owner INTERUNIVERSITAIR MICRO ELECTRONICS CENT (IMEC VZW)
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