Method and device for polishing semiconductor wafer
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- WINGO TECH CO LTD
- Publication Date
- 2016-04-06
Smart Images
Figure 1 Figure 2
Abstract
Description
technical field
[0001] The invention relates to a grinding method and a grinding device for a semiconductor wafer. Background technique
[0002] Generally, polishing of a semiconductor wafer is performed in multiple stages. Specifically, it is roughly divided into rough grinding for the purpose of increasing the flatness of the semiconductor wafer, and finish grinding for the purpose of reducing the surface roughness. Furthermore, studies have been made to perform such high-precision polishing of semiconductor wafers (for example, refer to Patent Document 1).
[0003] In the double-sided polishing device used in the method described in Patent Document 1, a light emitting unit that emits parallel light rays and a photosensitive unit that receives parallel light rays are arranged to face the internal gear.
[0004] In such a double-sided polishing device, if the carrier and the semiconductor wafer inserted into the carrier hole of the carrier enter the light transmission are...