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Stripping method of chip epitaxial substrate

An epitaxial substrate and chip technology, applied in electrical components, circuits, semiconductor devices, etc., can solve problems such as low product yield, and achieve the effects of high yield, low cost, and uniform force

Active Publication Date: 2016-05-11
广州市艾佛光通科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the conductive substrate is also immersed in the solution during the corrosion process, the corrosion solution will also corrode the conductive substrate, making the product yield lower

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] A method for peeling off a chip epitaxial substrate, the two sides of the chip are respectively provided with a conductive substrate and an epitaxial substrate, and the epitaxial substrate is a Si substrate, comprising the steps of:

[0039] a. Take the chip, and then use UV dicing tape (the UV dicing tape of model 6360-50 produced by Liontec Company)

[0040] ) is adhered to the surface of the conductive substrate of the chip, so that the surface of the conductive substrate is covered by the UV dicing tape, and then the air bubbles between the conductive substrate and the UV dicing tape are squeezed out; the chip is cleaned after the UV dicing tape is adhered. The above cleaning process is as follows: put the chip into a beaker, pour ethanol to submerge the chip, and then oscillate ultrasonically for 3 minutes; then pour out ethanol, then pour deionized water to submerge the chip, and oscillate ultrasonically for 3 minutes; take out the chip, and then use a nitrogen gun...

Embodiment 2

[0049] A stripping method of a chip epitaxial substrate, which is different from the first embodiment in that the NaOH solution is used to etch and strip the Si substrate in step d, and the remaining steps and parameters are the same as the first embodiment.

[0050] Take 100 LED vertical chips, and use the method of this embodiment to peel off the Si substrate on the above-mentioned LED vertical chips. After the treatment is completed, observe the surface of the LED vertical chips, and no warping or cracking occurs on the 100 chips. It can be seen that the method of the present invention has a high yield.

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PUM

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Abstract

The invention relates to a stripping method of a chip epitaxial substrate. Two sides of a chip are respectively provided with a conducting substrate and an epitaxial substrate, wherein the epitaxial substrate is a Si substrate. The method comprises the following steps: well protecting the conducting substrate of an LED chip first by utilizing a UV cutting adhesive tape, then adhering onto a strong acid-alkali resistant sheet by utilizing wax, and then performing corrosion in a corrosion solution. The stripping method of the chip epitaxial substrate has the advantages of low cost, high rate of finished products and capability of effectively protecting the chip and avoiding the warping and fracturing.

Description

technical field [0001] The invention relates to the field of chip preparation, in particular to a peeling method of a chip epitaxial substrate. Background technique [0002] LED has the advantages of environmental protection, energy saving, etc., and has broad prospects for development, and is known as the fourth generation of green lighting sources. High-power and high-brightness LEDs have great prospects for replacing incandescent lamps. Industrially, one of the ways to produce white light is to cover blue GaN-based LEDs with phosphors. [0003] The sapphire growth substrate is an industrialized substrate for growing GaN-based LEDs. However, its price is high and its diameter is small, so the production cost is high. There is a large lattice mismatch (16%) and thermal mismatch (25%) between it and GaN, resulting in poor quality of the grown GaN film; although the lattice mismatch between SiC and GaN is only 3.5%, the thermal conductivity It is relatively high, but its ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/00
CPCH01L33/0066H01L33/0075H01L33/0093
Inventor 李国强
Owner 广州市艾佛光通科技有限公司
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