Apparatus and method for measuring inclination and verticality of photoetching machine mask table

A technology of mask table and verticality, which is applied in the direction of measuring device, optical device, photolithographic exposure device, etc., which can solve the problems of shape fluctuation and so on

Active Publication Date: 2016-06-08
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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Problems solved by technology

[0002] During the movement of the mask table of the scanning lithography machine in the horizontal direction, its vertical actuator is limited by the processing accuracy of the mask table marble, or because the mirror measured by the interferometer cannot be kept parallel to the ideal surface, there is a shape ups and downs

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  • Apparatus and method for measuring inclination and verticality of photoetching machine mask table
  • Apparatus and method for measuring inclination and verticality of photoetching machine mask table
  • Apparatus and method for measuring inclination and verticality of photoetching machine mask table

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Embodiment Construction

[0024] Specific embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings.

[0025] The invention provides a method for measuring the inclination and verticality of a mask table of a photolithography machine, which is applied in a scanning exposure system. The measuring device used in the method of the present invention includes a focusing and leveling system for measuring the shape of the mask table, such as figure 1 shown. Schematic diagram of possible photodetection structures for this system, which can also be implemented with grating structures, gas pressure, capacitive or mechanical means. The structure realizes the measurement of the height position change of the reticle during the horizontal movement of the mask table based on the principle of triangulation. These include light sources and photodetectors. The light source and photodetector are distributed on both sides of the objective lens. Such as figure...

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Abstract

The invention discloses an apparatus for measuring the inclination and the verticality of a photoetching machine mask table. The apparatus is characterized by comprising: a light source for proving a plurality of uniformly distributed light spots positioned at a straight line to a mask plate, wherein the alignment direction of the plurality of the light spots is perpendicular to two parallel edges of the mask plate and is parallel to other two parallel edges of the mask plate; a photodetector for detecting the verticality values of the plurality of the light spots reflected by the mask plate; and a processor for calculating the inclination deviation of the mask table according to the verticality values of the light spot.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to a device and method for measuring the inclination and verticality of a mask table of a photolithography machine. Background technique [0002] During the horizontal movement of the mask table of the scanning lithography machine, the vertical actuator is limited by the processing accuracy of the mask table marble, or because the mirror measured by the interferometer cannot be kept parallel to the ideal surface, there is a shape Ups and downs. Therefore, during the scanning exposure process of moving along the horizontal direction, the mask carried by it has a certain height and inclination deviation relative to the optimum object plane of the projection objective lens. The error terms due to this situation are called mask table scan tilt and scan roll. Therefore, in order to achieve the best exposure effect, the deviation must be measured, and the deviat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G03F9/00G01B11/26
Inventor 陈南曙
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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