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Diamond-like carbon film deposition device

A deposition device, diamond technology, applied in metal material coating process, ion implantation plating, gaseous chemical plating, etc., can solve problems such as the imbalance of the electric field in the vacuum chamber, and achieve the effect of easy cleaning and guaranteed deposition effect

Active Publication Date: 2016-06-15
CHENGDU CVAC VACUUM TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] By providing a diamond-like carbon film deposition device, the present invention solves the technical problem in the prior art that opening a door on the side wall of the vacuum chamber will cause the electric field inside the vacuum chamber to be unbalanced

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Embodiment Construction

[0032] In order to solve the technical problem that the opening of the door on the side wall of the vacuum chamber will cause the unbalanced electric field inside the vacuum chamber in the prior art, the present invention provides a diamond-like carbon film deposition device, by adding an electric field at the opening on the side wall of the vacuum chamber The balance mechanism uses the electric field balance mechanism to complement the opening on the side wall of the vacuum chamber, so as to ensure the balance of the electric field in the vacuum chamber and ensure the deposition effect.

[0033] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the prese...

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Abstract

The invention relates to the technical field of film coating, in particular to a diamond-like carbon film deposition device. An upper cover of a vacuum chamber is opposite to the chamber bottom of the vacuum chamber, and the side wall of the vacuum chamber is connected with the upper cover and the chamber bottom to form a chamber. An opening is formed in the side wall. A door is connected with the vacuum chamber and used for covering the opening. An electric field balancing mechanism is detachably connected to the position, on the opening, of the side wall and used for complementing the opening, the electric field balancing mechanism is in a plate shape, and the dimension of the electric field balancing mechanism is larger than or equal to that of the opening. An anode target and a cathode target are arranged in the vacuum chamber and arranged oppositely, and the cathode target is located between the chamber bottom of the vacuum chamber and the anode target. A driving mechanism penetrates the chamber bottom to be connected with the cathode target. A vacuumizing device communicates with the vacuum chamber. Due to the fact that the electric field balancing mechanism is additionally arranged on the opening in the side wall of the vacuum chamber, electric field balance in the vacuum chamber can be guaranteed.

Description

technical field [0001] The invention relates to the field of coating technology, in particular to a diamond-like carbon film deposition device. Background technique [0002] Diamond-like carbon film (DiamondLikeCarbon, DLC) is a metastable material formed in the form of sp3 and sp2 bonds. It not only has the excellent characteristics of diamond and graphite, but also has high hardness, high resistivity and good optics. Performance, but also has its own unique tribological properties, can be widely used in machinery, electronics, optics, thermals, acoustics and medicine and other fields. [0003] Since DLC is a metastable material, energetic ions are required to bombard the growth surface during the preparation process. Usually, physical vapor deposition methods, chemical deposition methods or plasma enhanced chemical vapor deposition (PlasmaEnhancedChemicalVaporDeposition, PECVD) methods are used for preparation, while PECVD methods Due to the fast deposition rate and good ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/26C23C14/06
CPCC23C14/0605C23C16/26
Inventor 向勇傅绍英徐子明杨小军闫宗楷
Owner CHENGDU CVAC VACUUM TECH CO LTD
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