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Photolithography mask as well as manufacturing method and photolithography method thereof

A photolithography mask and mask pattern technology, applied in the field of photolithography mask production, can solve the problems of semiconductor layer or metal wiring performance degradation, damage, affecting display panel performance and product yield, etc. and make it simple and efficient, improving performance and productivity

Active Publication Date: 2016-07-13
BOE TECH GRP CO LTD +1
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  • Abstract
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Problems solved by technology

Once electrostatic discharge occurs during the photolithography process, the instantaneous high voltage or high current will cause the performance of the semiconductor layer or metal wiring on the display panel to degrade or even be destroyed, which will seriously affect the performance and products of the produced display panel. Yield

Method used

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  • Photolithography mask as well as manufacturing method and photolithography method thereof
  • Photolithography mask as well as manufacturing method and photolithography method thereof
  • Photolithography mask as well as manufacturing method and photolithography method thereof

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Embodiment Construction

[0031] Exemplary embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The drawings are schematic, not drawn to scale, and are intended only to illustrate embodiments of the invention and are not intended to limit the scope of protection of the invention. In the drawings, the same reference numerals denote the same or similar parts. In order to make the technical solution of the present invention more clear, process steps and device structures well known in the art are omitted here.

[0032] figure 1 A top view of a photolithographic mask blank according to one embodiment of the invention is illustrated. Such as figure 1 As shown, the photolithography mask plate includes a mask pattern arranged on the top surface of a base substrate (not shown), and a conductive connection pattern 2 arranged on the top surface. As shown, the conductive connection pattern 2 electrically connects the separated parts 1a, 1b, 1c, 1d...

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Abstract

The invention provides a photolithography mask, a manufacturing method thereof and a photolithography method using the photolithography mask. The photolithography mask comprises a substrate basal plate, a mask pattern arranged on the surface of the substrate basal plate and a conductive connection pattern arranged on the surface, wherein the conductive connection pattern is used for enabling separated parts of the mask pattern to be electrically connected together.

Description

technical field [0001] The present invention generally relates to the display field, and in particular relates to a photolithography mask, a photolithography method using the photolithography mask, and a method for manufacturing the photolithography mask. Background technique [0002] In the manufacturing process of the display panel, a photolithography process is often used to manufacture the pattern layer on the display panel. Photolithography masks used in lithography processes will inevitably be introduced with electrostatic charges during production, testing and transportation. Since photolithography masks usually use organic materials such as insulating glass as the substrate, it is not conducive to the release of electrostatic charges. When the electrostatic charge on the photomask is accumulated to a certain extent, electrostatic discharge may occur between the separated parts of the mask pattern on the photomask. Once electrostatic discharge occurs during the phot...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/40
CPCG03F1/40H01L27/1288
Inventor 吕振华陈希王世君包智颖张勇李月肖文俊薛艳娜姜文博
Owner BOE TECH GRP CO LTD
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