Anode Structure of Organic Light Emitting Diodes
A light-emitting diode and anode structure technology, which is applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of simple metal migration, lower anode structure yield, organic light-emitting diode black spots, etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0038] Please refer tofigure 1 The anode structure 100 includes a first oxide semiconductor layer 110 , a first reflective layer 120 , a second reflective layer 130 , and a second oxide semiconductor layer 190 arranged in sequence. Both the first oxide semiconductor layer 110 and the second oxide semiconductor layer 190 are ITO layers. The first reflective layer 120 is an Ag alloy layer, and the second reflective layer 130 is an Ag alloy layer. The thickness of the first reflective layer 120 is 10nm, wherein the content ratios of Pd, Cu, Au, Nd and Ge are respectively 0.01%, 0.01%, 0.01%, 0.01%, 0.01%; the thickness of the second reflective layer 130 is 120nm, Among them, the content ratios of Pd, Cu, Au, Nd and Ge are 3.00%, 3.00%, 3.00%, 3.00% and 2.00%, respectively.
Embodiment 2
[0040] Please refer to figure 2 The anode structure 200 includes a first oxide semiconductor layer 210 , a first reflective layer 220 , a second reflective layer 230 , a third reflective layer 240 and a second oxide semiconductor layer 290 arranged in sequence. Both the first oxide semiconductor layer 210 and the second oxide semiconductor layer 290 are ITO layers. The first reflective layer 220 , the second reflective layer 230 and the third reflective layer 240 are all Ag alloy layers. The thicknesses of the first reflective layer 220 and the third reflective layer 240 are both 10nm, and the contents of Pd, Cu, Au, Nd and Ge in both are respectively 0.01%, 0.01%, 0.01%, 0.01%, 0.01%; The thickness of the second reflective layer 230 is 130 nm, and the content ratios of Pd, Cu, Au, Nd and Ge in the second reflective layer 230 are 3.00%, 3.00%, 3.00%, 3.00% and 2.00%, respectively.
Embodiment 3
[0042] Please refer to image 3 , the anode structure 300 includes a first oxide semiconductor layer 310, a first reflective layer 320, a fourth reflective layer 350, a second reflective layer 330, a fifth reflective layer 360, a third reflective layer 340, and a second oxide semiconductor layer arranged in sequence semiconductor layer 390 . Both the first oxide semiconductor layer 310 and the second oxide semiconductor layer 390 are ITO layers. The first reflective layer 320 , the second reflective layer 330 , the third reflective layer 340 , the fourth reflective layer 350 and the fifth reflective layer 360 are all Ag alloy layers. The thicknesses of the first reflective layer 320, the third reflective layer 340, the fourth reflective layer 350, and the fifth reflective layer 360 are all 10nm, and the thickness of the second reflective layer 330 is 60nm; the Pd, Cu, The content ratios of Au, Nd and Ge are 3.00%, 3.00%, 3.00%, 3.00%, 2.00%, respectively, and the total conte...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


