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Method for detecting concentrations of sulfuric acid and phosphoric acid in chemical polishing liquid containing sulfuric acid and phosphoric acid

A technology of phosphoric acid chemistry and phosphoric acid concentration, applied in the detection of sulfuric acid, phosphoric acid concentration, and sulfuric acid in phosphoric acid chemical polishing liquid, can solve problems such as inability to achieve results, and achieve the effect of reducing replacement cycle and cost.

Inactive Publication Date: 2016-08-24
SHENYANG FORTUNE PRECISION EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But none of them can achieve the desired effect. Therefore, this case is dedicated to the detection of the concentration of sulfuric acid and phosphoric acid in the mixed liquid of sulfuric acid and phosphoric acid.

Method used

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  • Method for detecting concentrations of sulfuric acid and phosphoric acid in chemical polishing liquid containing sulfuric acid and phosphoric acid

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Embodiment

[0017] Embodiment: the present invention detects the method for sulfuric acid, phosphoric acid concentration in sulfuric acid, phosphoric acid chemical polishing liquid, specifically comprises the steps:

[0018] (1), get 5ml chemical polishing bath solution in the volumetric flask of 100ml to constant volume;

[0019] (2), get 20ml constant volume solution, be divided into two parts of equal volume, each part is 10mL, utilize potentiometric automatic titrator, the solution is detected;

[0020] (3), the volume of the sodium hydroxide consumed when recording the first stoichiometric point (PH=4.7) is V1; The volume of the sodium hydroxide consumed when recording the first stoichiometric point (PH=9.7) is V2, According to the calculation formula m H3PO4 =(V 2 -V 1 )*C NaOH *98*b,C H3PO4 = m H3PO4 / V;C H2SO4 =(2V 1 —V 2 )*98*C NaOH Obtain the concentration of sulfuric acid and phosphoric acid.

[0021] (4), configure sulfuric acid, phosphoric acid 1:9 chemical throwin...

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Abstract

The invention relates to a method for detecting concentrations of sulfuric acid and phosphoric acid in chemical polishing liquid containing sulfuric acid and phosphoric acid and belongs to the technical field of solution detection methods. The method comprises the following steps: carrying out volume fixing on a ml of chemical polishing bath solution and purified water in a fixed proportion, wherein the proportion value b is 20; dividing a small amount of constant volume solution into two parts with same volume, continuously adding 1mol / L sodium hydroxide solution by virtue of an instrument to generate acid-base neutralization, and detecting the volume of consumed sodium hydroxide; detecting the first part of solution, so as to obtain V1, wherein V1 is the volume of consumed sodium hydroxide at a first stoichiometric point: PH is equal to 4.7; similarly, obtaining V2, wherein V2 is the volume of consumed sodium hydroxide at a first stoichiometric point: PH is equal to 9.7; respectively calculating the masses of sulfuric acid and phosphoric acid in the chemical polishing liquid. According to the method, the concentrations of sulfuric acid and phosphoric acid in the chemical polishing liquid can be accurately controlled, the replacement cycle of the bath solution is reduced, and the cost is lowered.

Description

technical field [0001] The invention belongs to the technical field of solution detection methods, in particular to a method for detecting the concentrations of sulfuric acid and phosphoric acid in sulfuric acid and phosphoric acid chemical polishing liquids. Background technique [0002] Chemical polishing is a method of eliminating wear marks and etching and leveling by selective dissolution of chemical reagents on uneven areas of the sample surface. In the chemical polishing solution, phosphoric acid mainly dissolves the metal aluminum and oxide film on the surface of aluminum or aluminum alloy products in the potential chemical polishing solution. When the concentration is low, a bright surface cannot be obtained; sulfuric acid can inhibit pitting corrosion and make the polished surface uniform. ,meticulous. Due to the low cost and low volatility of sulfuric acid, it is still widely used in production. With the production and use, the concentration of sulfuric acid and...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N31/16
CPCG01N31/16
Inventor 柯沂妤郑广文
Owner SHENYANG FORTUNE PRECISION EQUIP CO LTD
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