Fabrication of Porous Silicon Nitride Support Membrane Window Panes

Abstract

The invention provides a porous silicon nitride supporting membrane pane. The porous silicon nitride supporting membrane pane comprises a substrate, front silicon nitride which covers one surface of the substrate, back silicon nitride which covers the other surface of the substrate and a window which penetrates through the substrate and the back silicon nitride. The front silicon nitride is provided with multiple through holes. The hole diameter and the hole distance of the through holes are controllable. According to the prepared porous silicon nitride supporting membrane pane, the hole diameter of the multiple generated holes is uniform and a supporting membrane has no residual impurity. The invention also provides a preparation method of the porous silicon nitride supporting membrane pane and a product or device used for transmission electronic microscope imaging.

Description

technical field [0001] The invention relates to a silicon nitride support film pane, in particular to a porous silicon nitride support film pane, and a preparation method and application of the porous silicon nitride support film. Background technique [0002] Compared with the traditional copper mesh microgrid, the silicon nitride support film window pane for transmission electron microscopy has the characteristics of high melting point, strong chemical inertness, and high strength. It is mainly used for in-situ heating, liquid environment or transmission electron microscopy of carbon-containing samples ( TEM) observation experiment. [0003] The non-porous traditional silicon nitride support film pane has been widely used in various transmission electron microscopy experiments due to its excellent physical and chemical properties. Because it can remain stable at very high temperatures (up to about 1000 degrees Celsius, related to the quality and thickness of the film), it...

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Problems solved by technology

[0007] The membrane produced by this method has some disadvantages: 1. Due to the method of self-assembly, the pore sizes produced are not uniform, and the stress that the membrane can withstand is reduced, and it is easy to break; 2. The procedure is too large. Many, and it is easy to leave impurities

3. The cost is too high, and the operation has potential safety hazards

[0009] This method also has some shortcomings: 1. The self-assembly method produces pores of different sizes, which can withstand uneven stress and are easy to break; 2. The rapid heating and crystallization of amorphous silicon may affect the quality of SiN; 3. Finally One-step porous silicon nitride is prone to cracking when taken out of the etchant

[0010] Although techniques such as FIB, FEB, and EBL can precisely realize the preparation of controllable nanoporous support membranes, the efficiency is too low to be suitable for commercial production.

Although self-assembly methods such as CsCl and amorphous silicon crystallization can prepare large-area nanoporous support membranes, they have the disadvantages of uneven pore size, complicated operation, potential safety hazards, and many side effects on the membrane.

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