GaN-based semiconductor device with composite gradual-change quantum barrier structure and preparation method of semiconductor device
A gallium nitride-based, multi-quantum well structure technology, applied in gallium nitride-based semiconductor devices and its preparation, in the field of gallium nitride-based semiconductor devices, can solve the problem of reducing electron-hole recombination efficiency and hindering carrier hole injection etc. to achieve the effects of reducing electron leakage, improving hole transport, and reducing inhomogeneity
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[0020] The technical solution of the present invention will be further explained below in conjunction with the accompanying drawings and preferred embodiments, but the specific implementation of the present invention is not limited thereto.
[0021] see figure 1 Shown is a schematic diagram of the indium composition in the multi-quantum well in a GaN-based LED device in a typical embodiment of the present invention and the aluminum composition in the AlGaN electron blocking layer above the multi-quantum well, and its growth direction is from the N-type Pointing to the P-type direction, 102, 104, 106, 108, and 110 are all InGaN quantum wells, and 101, 103, 105, 107, 109, and 111 are InGaN quantum barriers. The first barrier 101 is not graded, and the other barriers are all graded composition, and the indium composition gradually decreases from N to P. On average, the average indium composition in different barriers increases gradually from N to P direction.
[0022] see agai...
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