The invention discloses a 
gallium nitride base light-emitting 
diode with a composite potential barrier. The 
gallium nitride base light-emitting 
diode comprises a 
sapphire substrate, a buffering layer, an n-type 
gallium nitride epitaxial layer, a 
multiple quantum well active area, a p-type algan epitaxial layer and a p-type 
gallium nitride epitaxial layer, wherein the 
sapphire substrate, the buffering layer, the n-type 
gallium nitride epitaxial layer, the 
multiple quantum well active area, the p-type algan epitaxial layer and the p-type 
gallium nitride epitaxial layer are arranged sequentially from bottom to top. A p-
type metal electrode is arranged on the upper surface of the p-type gallium nitride epitaxial layer. An n-type 
electrode is arranged on a lower platform surface of the n-type gallium nitride epitaxial layer. The 
multiple quantum well active area comprises 5-20 
indium gallium nitride 
potential well layers which are arranged at intervals from bottom to top. A first kind composite potential 
barrier layer is arranged between every two 
indium gallium nitride potential barrier 
layers. A second kind composite 
potential well layer is arranged on the upper surface of an 
indium gallium nitride 
potential well layer at the top layer. According to the composite potential barrier, at the 
contact position of an aluminum, gallium and 
indium nitride layer and an InGaN potential well layer, a built-in 
electric field which is produced due to a polarization effect can be decreased through adjustment of aluminum (Al) and indium (In). On a contact interface between an AlInGaN layer and a GaN layer, a ratio between the Al and the In is adjusted to be 0.83:0.17, and lattices of the Al and the In are enabled to be matched.