Preparation technology of light blue low-reflection solar control film-plating glass
A solar control and coated glass technology, applied in the direction of coating, etc., can solve the problems of low visible light transmittance, high visible light transmittance, and cumbersome process steps of glass, so as to ensure visible light transmittance, reduce light pollution, and process steps simple effect
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Embodiment 1
[0027] (1) First send the tin source and antimony source to the first evaporator for heating and vaporization, and the heating and gasification temperature of the first evaporator is 165°C, and then send the vaporized tin source and antimony source to the first pre-evaporator Inside and O 2 、H 2 O heating and mixing to form the first pre-mixed gas, the first pre-evaporator heating and mixing temperature is 50 ° C, and then the carrier gas is mixed with the first pre-mixed gas to form the first reaction gas and then sent to the first coating reactor, so that the second A reaction gas reacts on the surface of the glass substrate to form the first antimony-doped tin dioxide layer. The reaction temperature of the first coating reactor is 650°C, the reaction time is 1.8s, and the gas flow rate of the first reaction gas is 630L / min. The molar percentage content of each raw material in the reaction gas is: 0.135% tin source (monobutyl tin trichloride), 0.015% antimony source (antimo...
Embodiment 2
[0039] (1) First send the tin source and antimony source to the first evaporator for heating and vaporization, and the heating and gasification temperature of the first evaporator is 185°C, and then send the vaporized tin source and antimony source to the first pre-evaporator Inside and O 2 、H 2 O heating and mixing to form the first pre-mixed gas, the first pre-evaporator heating and mixing temperature is 100 ° C, and then the carrier gas is mixed with the first pre-mixed gas to form the first reaction gas and then sent to the first coating reactor, so that the second A reaction gas reacts on the surface of the glass substrate to form the first antimony-doped tin dioxide layer. The reaction temperature of the first coating reactor is 660°C, the reaction time is 4.98s, and the gas flow rate of the first reaction gas is 680L / min. The molar percentage content of each raw material in the reaction gas is: 0.234% tin source (dimethyl tin dichloride), 0.026% antimony source (antimo...
Embodiment 3
[0042] (1) First send the tin source and antimony source to the first evaporator for heating and vaporization. The heating and gasification temperature of the first evaporator is 180°C, and then send the vaporized tin source and antimony source to the first pre-evaporator Inside and O 2 、H 2 O heating and mixing to form the first pre-mixed gas, the first pre-evaporator heating and mixing temperature is 80°C, and then the carrier gas is mixed with the first pre-mixed gas to form the first reaction gas, which is sent to the first coating reactor, so that the second A reaction gas reacts on the surface of the glass substrate to form the first antimony-doped tin dioxide layer. The reaction temperature of the first coating reactor is 655°C, the reaction time is 3s, and the gas flow rate of the first reaction gas is 650L / min. Control the first The mole percentage content of each raw material in the reaction gas is: 0.24% tin source (monobutyl tin trichloride), 0.022% antimony sourc...
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