Method for improving femtosecond laser processing accuracy

A femtosecond laser processing and precision technology, applied in laser welding equipment, metal processing equipment, manufacturing tools, etc., can solve problems such as differences

Active Publication Date: 2016-11-30
NINGBO UNIV
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Problems solved by technology

In the actual processing process, the longitudinal length of the focused spot is only about 1 μm. In order to obtain the preset micro-nano structure, the longitudinal height error of the entire area to be processed must be less than 1 μm. When the length of the proces

Method used

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  • Method for improving femtosecond laser processing accuracy
  • Method for improving femtosecond laser processing accuracy
  • Method for improving femtosecond laser processing accuracy

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Embodiment 1

[0028] Embodiment 1: a method for improving the precision of femtosecond laser processing, the processing equipment is set as figure 1The shown sample distance detection device detects the distance of the sample 14 to be processed placed on the processing equipment before the femtosecond laser processing through the sample distance detection device, thereby improving the accuracy of the femtosecond laser processing; the sample distance detection device includes A laser 1 for emitting a processing beam, a laser power tuning mechanism 2, a shutter 3, a first polarization beam splitter prism 4, a total reflection mirror 5, a laser beam diameter adjustment system 6, a second polarization beam splitter prism 7, The objective lens 8 and the three-dimensional mobile platform 9 for placing samples, the laser power tuning mechanism 2 is composed of a first polarizer 21, a wave plate 22 and a second polarizer 23, the power tuning accuracy is 1 μW, and the laser beam diameter adjustment s...

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Abstract

The invention discloses a method for improving the femtosecond laser processing accuracy. The method includes the steps that a measuring platform and a micro-nano structure processing platform are integrated, a sample distance detecting device and the rotation matrix method are combined, the position data of four to-be-processed areas is obtained through the detecting device and substituted into a rotation matrix, then calculation is carried out to obtain the corrected micro-nano structure position data, the data is substituted into a processing system, and the laser spot center is accurately positioned on a sample. The method has the advantages that switching between different platforms is not required, the surface height data is measured to be directly input to a computer, the errors caused by slopes of a to-be-processed sample, a substrate and the surface of a three-dimensional movable platform are eliminated with the rotation matrix method, the position of the processed sample is accurately positioned, the to-be-processed sample is accurately arranged at the center of a laser spot, the accuracy of laser micro-nano processing is further improved, the accuracy of femtosecond laser processing can reach about 300 nm accordingly, and it is guaranteed that the actual obtained structure and the preset structure are same.

Description

technical field [0001] The invention relates to a method for femtosecond laser processing, in particular to a method for improving the precision of femtosecond laser processing. Background technique [0002] with CO 2 Laser, Nd:YAG laser and KrF 2 Compared with ultraviolet excimer laser, femtosecond laser direct writing micro-nano structure has small thermal effect, high precision and true three-dimensional processing capability. It is an ideal tool for the preparation of micro-nano optical devices and can be widely used in optofluidic chips, photonic crystals, Microcavity lasers and high-density optical storage and other fields. Femtosecond lasers can inject energy into highly spatially selective regions of a material within a time shorter than the thermal diffusion of the lattice. After focusing, the laser power density can be as high as 10 15 W / cm 2 , even if the material itself does not have intrinsic absorption at this wavelength, due to nonlinear processes such as...

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Application Information

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IPC IPC(8): B23K26/042B23K26/03
CPCB23K26/032B23K26/042
Inventor 刘画池宋宝安姚剑婷金友良
Owner NINGBO UNIV
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