Molybdenum-containing composite nitride antifriction coating and preparation method thereof
A technology of nitrides and coatings, which is applied to molybdenum-containing composite nitride antifriction coatings. In the field of preparation of the coatings, it can solve the problems that the coatings cannot adapt to high-speed dry cutting technology, etc., and achieve easy industrial production, low friction coefficient and specific wear. efficiency, to achieve the effect of industrialized production
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Embodiment 1
[0032] After the workpiece is cleaned and dried, put it into a vacuum chamber and vacuumize it to 5.0×10 -3 After Pa, argon gas is introduced, and the flow rate of argon gas is 22sccm; the negative bias voltage is -400V loaded on the workpiece, the pulse frequency is 250KHz, and the pulse width is 500ns, and the flow of chromium target, titanium target, aluminum target and molybdenum target is adjusted to 0.5A, ion bombardment cleaning for 25min; adjust the workpiece negative bias to -60V, pulse frequency to 250KHz, pulse width to 500ns, workpiece holder speed to 4r / min, adjust the current of chromium target, titanium target, aluminum target and molybdenum target respectively To 4.5A, 6A, 6A and 5A, nitrogen gas is introduced, the set value of OPM is 55%, and the coating deposition time is 120min.
[0033] The modulation period of the coating obtained in Example 1 is 8nm, the atomic percentage of the Mo element in the coating is 15.0%, the thickness of the coating is 4 μm, the...
Embodiment 2
[0035] After cleaning and drying the workpiece, put it into the vacuum chamber and vacuumize it to 4.5×10 -3 After Pa, argon gas is introduced, and the flow rate of argon gas is 20sccm; the negative bias voltage is -400V loaded on the workpiece, the pulse frequency is 200KHz, and the pulse width is 600ns, and the flow of chromium target, titanium target, aluminum target and molybdenum target is adjusted to 0.4A, ion bombardment cleaning for 20min; adjust the workpiece negative bias to -65V, pulse frequency to 200KHz, pulse width to 400ns, workpiece holder speed to 5r / min, adjust the current of chromium target, titanium target, aluminum target and molybdenum target respectively To 4.5A, 6A, 6A and 5A, nitrogen gas is introduced, the set value of OPM is 50%, and the coating deposition time is 100min.
[0036] The modulation period of the coating obtained in Example 2 is 7.2nm, the atomic percentage of the Mo element in the coating is 15.0%, the thickness of the coating is 3.2 μm...
Embodiment 3
[0038] After cleaning and drying the workpiece, put it into a vacuum chamber and vacuumize it to 3.8×10 -3 After Pa, argon gas is introduced, and the flow rate of argon gas is 20sccm; the negative bias voltage is -350V loaded on the workpiece, the pulse frequency is 250KHz, and the pulse width is 800ns, and the flow of chromium target, titanium target, aluminum target and molybdenum target is adjusted to 0.3A, ion bombardment cleaning for 20min; adjust the workpiece negative bias to -60V, pulse frequency to 250KHz, pulse width to 450ns, workpiece holder speed to 6r / min, adjust the current of chromium target, titanium target, aluminum target and molybdenum target respectively To 3.5A, 5A, 5A and 4A, the set value of OPM is 45%, and the coating deposition time is 120min.
[0039]The modulation period of the coating obtained in Example 3 is 4.8nm, the atomic percentage of the Mo element in the coating is 13.9%, the thickness of the coating is 3.3 μm, the hardness is 3100HV, the f...
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