Inductive coupling plasma processing system and processing method
A technology for processing systems and plasmas, applied to plasmas, circuits, discharge tubes, etc., can solve the problems of certain reflected power, inability to match, and affect the shape of through holes, etc., to achieve wide impedance matching range, fast and accurate impedance, The effect of improving the shape
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[0025] In order to make the objectives, technical solutions, and beneficial effects of the present invention clearer and more complete, the specific embodiments of the present invention will be described below with reference to the accompanying drawings.
[0026] As mentioned in the background art section, the existing matching network either has the defect of slow response speed, or cannot always obtain a small reflected power under low applied power. It is known from this that the existing inductively coupled plasma processing The system cannot achieve fast and accurate impedance matching between the RF power supply and the plasma. In order to overcome the above-mentioned defects, the present invention provides a new inductively coupled plasma processing system. See for details figure 1 .
[0027] figure 1 It is a schematic structural diagram of an inductively coupled plasma processing system provided by an embodiment of the present invention. Such as figure 1 As shown, the ind...
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