Passivator for metal plates
A passivation agent, metal plate technology, applied in the direction of metal material coating process, etc., can solve the problems of heat resistance, cold resistance, weather resistance of protective film, unsatisfactory surface finish, etc., and achieve excellent rust prevention and good surface finish. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0053] Metal plate passivator, consists of the following components by weight:
[0054] 1 to 2 parts of phosphoric acid,
[0055] 7.8 parts phosphoric acid,
[0056] 0.7 part yam yam residue extract,
[0057] 1.1 parts sodium lauryl sulfonate,
[0058] 2.3 parts of vinyltrimethoxysilane,
[0059] 0.9 parts of dodecyltrimethylammonium bromide,
[0060] 8.4 parts of hydroxyethylidene diphosphonic acid,
[0061] 1.2 parts sodium alkyl sulfosuccinate,
[0062] 0.7 part sodium aluminate,
[0063] 36 parts deionized water.
Embodiment 2
[0065] Metal plate passivator, consists of the following components by weight:
[0066] 1 part phosphoric acid,
[0067] 7.8 parts phosphoric acid,
[0068] 0.7 part yam yam residue extract,
[0069] 1.1 parts sodium lauryl sulfonate,
[0070] 2.3 parts of vinyltrimethoxysilane,
[0071] 0.9 parts of dodecyltrimethylammonium bromide,
[0072] 8.4 parts of hydroxyethylidene diphosphonic acid,
[0073] 1.2 parts sodium alkyl sulfosuccinate,
[0074] 0.7 part sodium aluminate,
[0075] 36 parts deionized water.
Embodiment 3
[0077] Metal plate passivator, consists of the following components by weight:
[0078] 2 parts phosphoric acid,
[0079] 7.8 parts phosphoric acid,
[0080] 0.7 part yam yam residue extract,
[0081] 1.1 parts sodium lauryl sulfonate,
[0082] 2.3 parts of vinyltrimethoxysilane,
[0083] 0.9 parts of dodecyltrimethylammonium bromide,
[0084] 8.4 parts of hydroxyethylidene diphosphonic acid,
[0085] 1.2 parts sodium alkyl sulfosuccinate,
[0086] 0.7 part sodium aluminate,
[0087] 36 parts deionized water.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com