Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Pretreatment fluid for TFT glass substrate thinning process

A technology of pretreatment liquid and glass substrate, which is applied in the field of TFT glass substrate etching pretreatment composition, can solve the problems of increasing processing cost, over-etching of glass substrate, affecting production efficiency, etc., to improve production efficiency, reduce pits, The effect of reducing the time of the grinding process

Active Publication Date: 2017-05-10
天津美泰真空技术有限公司
View PDF3 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The TFT display screen demanded by the market is becoming more and more ultra-thin. In the manufacture of ultra-thin TFT display screens, the thickness of the glass substrate required is thinner. It is necessary to thin the existing specification glass substrate. The etching solution of hydrofluoric acid is used for thinning treatment. After the thinning treatment, the surface of the glass substrate often has pits caused by local over-etching, and it is necessary to perform a long-term polishing treatment on the surface of the substrate, which seriously affects the production efficiency and improves the production efficiency. processing cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pretreatment fluid for TFT glass substrate thinning process
  • Pretreatment fluid for TFT glass substrate thinning process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0006] A kind of TFT glass substrate thinning process pretreatment liquid provided by the present invention is prepared by the following method,

[0007] 1) Mix the prescribed amount of hydrochloric acid and hydrofluoric acid, and add appropriate amount of water to dilute

[0008] 2) Dissolve the prescribed amount of hydroxypropyl-β-cyclodextrin in an appropriate amount of water until completely dissolved, and then add;

[0009] 3) Dissolve the prescribed amount of PVA in an appropriate amount of water until completely dissolved

[0010] 4) Mix the solutions obtained in steps 2) and 3), then slowly add the mixed solution obtained in step 1), add the prescribed amount of polydimethylsiloxane, make up the prescribed amount of water and stir until a uniform solution is formed.

[0011] The formula of embodiment 1~4 sees the following table (mass percentage wt%)

[0012]

[0013] The method of carrying out thinning pretreatment to the pretreatment liquid that embodiment 1~4 o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A pretreatment fluid for a TFT glass substrate thinning process is characterized by being prepared from, by mass, 10-20% of hydrochloric acid (HCl), 2%-5% of hydrofluoric acid (HF), 5-10% of polyvinyl alcohol (PVA), 0.5-1% of polydimethylsiloxane, 1-2% of hydroxypropyl-beta-cyclodextrin and the balance water.

Description

technical field [0001] The invention relates to a composition for etching pretreatment of TFT glass substrates. Background technique [0002] The TFT display screen demanded by the market is becoming more and more ultra-thin. In the manufacture of ultra-thin TFT display screens, the thickness of the glass substrate required is thinner. It is necessary to thin the existing specification glass substrate. The etching solution of hydrofluoric acid is used for thinning treatment. After the thinning treatment, the surface of the glass substrate often has pits caused by local over-etching, and it is necessary to perform a long-term polishing treatment on the surface of the substrate, which seriously affects the production efficiency and improves the production efficiency. Processing costs. In order to reduce the pits in the thinning treatment, in addition to adding additives to the hydrofluoric acid-based etching solution, it is also possible to pre-treat the glass substrate of th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
Inventor 张杰沈励郑建军姚仕军夏伟吴青肖
Owner 天津美泰真空技术有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products