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Optical system distortion measuring method based on Shack-Hartmann wave-front sensor

An optical system and measurement method technology, applied in the direction of geometric characteristics/aberration measurement, testing optical performance, etc., can solve problems such as the inability to meet the application problems of large-diameter and large-field telescopes, and achieve enhanced versatility and scalability. Measurement cost and effect of improving measurement accuracy

Active Publication Date: 2017-05-31
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0007] In order to solve the problem that the current distortion measurement method cannot meet the application of large aperture and large field of view telescopes, this invention proposes a measurement method for optical system distortion based on the Shaker-Hartmann wavefront sensor

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Embodiment Construction

[0025] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0026] The principle of optical system distortion measurement involved in the present invention is shown in figure 1 , mainly including the parallel light source 1, the entrance pupil 2 of the optical system under test 3, the optical system under test 3 and its wave aberration 4, the actual image plane 5, the Gaussian image plane 6, the Shaker-Hartmann wavefront sensor 7 and Exit pupil 8.

[0027] In the measurement method of the present invention, a small-caliber parallel light source 1 is used for measurement, and the diameter is smaller than that of the measured optical system 3, which can be selected according to the size of the wave aberration 4 of the measured optical system 3 and the requirements for distortion measurement accuracy. The parallel light source 1 needs to rotate around the center of the entrance pupil 2 of the op...

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Abstract

The invention relates to an optical system distortion measuring method based on a Shack-Hartmann wave-front sensor. The measuring method includes: adopting a small-caliber parallel light source (1) to enter a measured optical system (3); enabling the Shack-Hartmann wave-front sensor (7) to be at a confocal position of the measured optical system (3) by scanning an image surface (5), and recording scanning angle omega' p1; utilizing the Shack-Hartmann wave-front sensor (7) to measure deviation angle omega' p2 caused by wave aberration (4) so as to acquire an actual emergent angle omega' p which is equal to omega' p1 plus omega' p2; acquiring relative distortion degree q and distortion degree delta y of the measured optical system (3) in different view field states according to an ideal emergent angle omega' o, an incident angel omega and focus f' of the measured optical system (3), wherein q is equal to (tan omega' o-tan omega' p) / tan omega' px100%, and delta y is equal to qf' tan omega. By the measuring method, measuring cost is lowered effectively, measuring accuracy is improved, and universality of the measuring method is enhanced.

Description

technical field [0001] The invention belongs to the technical field of optical system detection, in particular to an optical system distortion measurement method based on a Shaker-Hartmann wavefront sensor. Background technique [0002] A large field of view optical system can improve utilization efficiency, but as the field of view increases, the distortion of the optical system will increase. Although the distortion does not affect the imaging quality of the optical system, it will cause image shape distortion. This shape distortion has different effects on different large field of view optical systems. For most non-precision measurement objectives such as photographic objectives, film imaging objectives and projection objectives used for common tasks or scenes, the relative distortion is as long as If it is not greater than 0.5%, it will not have much influence, because this is the deformation when the human eye has not been aware of the straight line imaging. For optica...

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Application Information

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IPC IPC(8): G01M11/02
CPCG01M11/0242
Inventor 张俊波张昂鲜浩张学军魏凌杨金生
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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