Optical system distortion measuring method based on Shack-Hartmann wave-front sensor

An optical system and measurement method technology, applied in the direction of geometric characteristics/aberration measurement, testing optical performance, etc., can solve problems such as the inability to meet the application problems of large-diameter and large-field telescopes, and achieve enhanced versatility and scalability. Measurement cost and effect of improving measurement accuracy

Active Publication Date: 2017-05-31
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF14 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In order to solve the problem that the current distortion measurement method cannot meet the application of large aperture and large fie

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical system distortion measuring method based on Shack-Hartmann wave-front sensor
  • Optical system distortion measuring method based on Shack-Hartmann wave-front sensor
  • Optical system distortion measuring method based on Shack-Hartmann wave-front sensor

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0025] The present invention will be further described in detail below with reference to the drawings and specific embodiments.

[0026] The optical system distortion measurement principle involved in the present invention is shown in figure 1 , Mainly including the parallel light source 1, the entrance pupil 2 of the measured optical system 3, the measured optical system 3 and its wave aberration 4, the actual image surface 5, the Gaussian image surface 6, the Shaker-Hartmann wavefront sensor 7 and Exit pupil 8.

[0027] In the measurement method of the present invention, a small-aperture parallel light source 1 is used for measurement, and the aperture is smaller than the aperture of the optical system 3 under test, which can be selected according to the size of the wave aberration 4 of the optical system under test 3 and the distortion measurement accuracy requirements. The parallel light source 1 needs to rotate around the entrance pupil 2 center of the optical system 3 under t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to an optical system distortion measuring method based on a Shack-Hartmann wave-front sensor. The measuring method includes: adopting a small-caliber parallel light source (1) to enter a measured optical system (3); enabling the Shack-Hartmann wave-front sensor (7) to be at a confocal position of the measured optical system (3) by scanning an image surface (5), and recording scanning angle omega' p1; utilizing the Shack-Hartmann wave-front sensor (7) to measure deviation angle omega' p2 caused by wave aberration (4) so as to acquire an actual emergent angle omega' p which is equal to omega' p1 plus omega' p2; acquiring relative distortion degree q and distortion degree delta y of the measured optical system (3) in different view field states according to an ideal emergent angle omega' o, an incident angel omega and focus f' of the measured optical system (3), wherein q is equal to (tan omega' o-tan omega' p)/tan omega' px100%, and delta y is equal to qf' tan omega. By the measuring method, measuring cost is lowered effectively, measuring accuracy is improved, and universality of the measuring method is enhanced.

Description

technical field [0001] The invention belongs to the technical field of optical system detection, in particular to an optical system distortion measurement method based on a Shaker-Hartmann wavefront sensor. Background technique [0002] A large field of view optical system can improve utilization efficiency, but as the field of view increases, the distortion of the optical system will increase. Although the distortion does not affect the imaging quality of the optical system, it will cause image shape distortion. This shape distortion has different effects on different large field of view optical systems. For most non-precision measurement objectives such as photographic objectives, film imaging objectives and projection objectives used for common tasks or scenes, the relative distortion is as long as If it is not greater than 0.5%, it will not have much influence, because this is the deformation when the human eye has not been aware of the straight line imaging. For optica...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): G01M11/02
CPCG01M11/0242
Inventor 张俊波张昂鲜浩张学军魏凌杨金生
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap