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Manufacturing device and method of large-scale grating

A manufacturing device and large-scale technology, applied in the field of manufacturing devices with large-sized gratings, can solve the problems of multiplication, high price, complex two-dimensional translation stage system, etc., achieve high manufacturing grating precision, reduce overall cost, and be easy to build and maintain. Effect

Active Publication Date: 2019-02-01
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, such a two-dimensional translation stage system is complex, expensive, and doubles with size expansion
It is difficult to make a two-dimensional translation stage with long travel and nanometer positioning accuracy with the existing domestic technology

Method used

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  • Manufacturing device and method of large-scale grating
  • Manufacturing device and method of large-scale grating

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Embodiment Construction

[0026] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0027] refer to figure 1 , figure 1 It is a three-dimensional schematic diagram of the device of the present invention. The exposure beam generated by the light source device 1 may be a fringe interference field formed by two beams, or a laser direct writing beam, or a dot matrix generated by a Damman grating. The light source device 1 is installed on the one-dimensional linear translation platform 2, and can perform uniform linear motion under the drive of the translation platform 2. The translation platform 2 is fixed on the gantry frame 3 . The above parts constitute the light source mobile module of the device.

[0028] Two one-dimensional precision translation stages 601 and 602 are installed in parallel under the gantry 3 as substrate translation stages. The movem...

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Abstract

The invention provides a manufacturing device and manufacturing method of a big grating. The device comprises the three parts of a light source moving module, a substrate moving module and a monitoring control module. Compared with a device for manufacturing a grating through a previous scanning beam method, the device divides two-dimensional motion of a grating substrate, a one-dimensional fine translation stand is adopted to drive a light source and the grating substrate respectively, the requirement of providing a two-dimensional fine translation platform is eliminated, and the system cost is drastically saved. The manufacturing device of the big grating is simple in structure, the area of the manufactured big grating is easy to extend. By combining a three-shaft laser interferometer positioning and close-loop adjusting control method, the big grating with high strip precision and parallelism can be effectively manufactured through the device.

Description

technical field [0001] The invention relates to grating photolithography, especially a large-sized grating manufacturing device and manufacturing method. Background technique [0002] As an important basic optical component, grating is widely used in many fields of national defense, scientific research and national economy. Especially in astronomical observation instruments, high-power laser pulse compression and long-distance precision measurement, large-size gratings are indispensable. [0003] In 2003, Carl Gang Chen introduced a method of writing large gratings using the scanning beam method in his doctoral dissertation (Carl Gang Chen. Beam Alignment and Image Metrology for Scanning Beam Interference Lithography—Fabricating Gratings with Nanometer Phase Accuracy.PhD Thesis,Massachusetts Institute of Technology, 2003.). This technology uses a coherent light beam to create an exposure fringe pattern, and uses a large-stroke two-dimensional precision translation stage to...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18
CPCG02B5/1857
Inventor 周常河向显嵩韦春龙李民康
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI