Photomask assembly, liquid crystal display panel, color filtering substrate and preparation method of color filtering substrate
A color filter substrate and photomask technology, applied in optics, nonlinear optics, instruments, etc., can solve the problems of high cost and long preparation process, and achieve the effect of reducing the preparation cost
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[0065] according to figure 1 Referring to the structure of the first embodiment of the color filter substrate shown in FIG. 3 , the present invention proposes a first embodiment of a method for preparing a color filter substrate. Such as Figure 4 As shown, the first embodiment of the preparation method of the color filter substrate of the present invention includes the following steps:
[0066] S101, sequentially depositing a first color-resist material, a second color-resist material and a third color-resist material on a base substrate.
[0067] S102, exposing the first color-resist material, the second color-resist material, and the third color-resist material through the first photomask, the second photomask, and the third photomask, respectively, to form a first filter film and a second filter film And the third filter film and black matrix.
[0068] Specifically, the first color-resist material is first deposited on the base substrate, and the first filter film is fo...
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