Plasmon refractive index sensor based on nano pattern and sensing method thereof
A technology of a refractive index sensor and a plasmon element, applied in the field of optical sensors, can solve problems such as limitation and complexity, and achieve the effects of high sensitivity, low preparation cost, and simple and mature preparation process
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Embodiment 1
[0032] The plasmonic element refractive index sensor based on the nano-pattern of the present embodiment is covered with a plasmonic element nano-antenna array composed of a series of rectangular gold nano-antennas with different lengths on the quartz substrate, and the width of the nano-antenna is 50 Nanometer, the length gradually increases from the center to the periphery in an arithmetic sequence, and the length of the antenna increases by 1 nanometer for each additional circle, the period of the array is 300 nanometers, the length of the antenna at the center is 80 nanometers, and the length of the antenna at the outermost circle of the array is 200 nanometers nanometer, gold nanoantenna thickness is 45 nanometers (such as figure 1 , image 3 ).
[0033] The preparation method of the nano-pattern-based plasmonic refractive index sensor of this embodiment:
[0034] (1) Deposit a layer of gold with a thickness of 45 nanometers on a clean transparent quartz wafer by electr...
Embodiment 2
[0045] The nanopattern-based plasmonic refractive index sensor of this embodiment is covered with a plasmonic nanoantenna array composed of a series of circular silicon nanoantennas with different diameters on the silicon substrate. The diameter of the nanoantennas ranges from One end of the array gradually increases in proportion to the other end, and the diameter of the antenna increases by 1.05 times for each additional period. The diameter of the smallest circular antenna at one end of the array is 50 nanometers, and it gradually changes to the other end for 100 periods, with a period of 500 nanometers. Silicon The thickness of the nanoantenna is 60 nm (such as Figure 4 ).
[0046] The preparation method of the nano-pattern-based plasmonic refractive index sensor of this embodiment:
[0047] (1) Spin-coat a layer of negative photoresist with a thickness of 100 nanometers on a clean silicon wafer.
[0048] (2) Using interference lithography equipment to prepare the above...
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