A parallel double gas chamber trace gas analysis system and gas concentration calculation method
A trace gas and analysis system technology, which is applied in the direction of material analysis, material analysis by optical means, and measurement devices, can solve the problems of increasing equipment cost, increasing equipment volume, and accumulating a large amount of calibration data to achieve accurate inversion. Effect
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[0040] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some, not all, embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0041] like figure 1A parallel double gas chamber trace gas analysis system is shown, including a circuit module 1, an optical module 2 and a gas path module 3,
[0042] The circuit module 1 is divided into a control circuit 1.1, a signal processing circuit 1.2 and a data processing unit 1.3, and the control circuit 1.1 includes a modulation waveform generator 1.1.1, a laser drive circuit 1.1.2 and a digital temperature control module 1.1.3, The modulation wa...
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