Full-automatic tubular PECVD (Plasma Enhanced Chemical Vapor Deposition) loading and unloading machine and method
A fully automatic, tube-type technology, applied in the direction of discharge tubes, conveyor objects, electrical components, etc., can solve the problems of high fragmentation rate, large pollution of silicon wafers, low efficiency, etc., to achieve reduced fragmentation rate, high work efficiency, and automation high degree of effect
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[0029] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. The components of the embodiments of the invention generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations. Accordingly, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts belong to the protection scope of the present invention.
[0030] Such as Figure 1 to Figure 3 ...
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