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Full-automatic tubular PECVD (Plasma Enhanced Chemical Vapor Deposition) loading and unloading machine and method

A fully automatic, tube-type technology, applied in the direction of discharge tubes, conveyor objects, electrical components, etc., can solve the problems of high fragmentation rate, large pollution of silicon wafers, low efficiency, etc., to achieve reduced fragmentation rate, high work efficiency, and automation high degree of effect

Inactive Publication Date: 2017-08-11
广东启天自动化智能装备股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the existing technology, it is customary to use manual loading or semi-automatic wafer replacement, which is prone to problems such as high fragmentation rate, large pollution to silicon wafers, and low efficiency.

Method used

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  • Full-automatic tubular PECVD (Plasma Enhanced Chemical Vapor Deposition) loading and unloading machine and method
  • Full-automatic tubular PECVD (Plasma Enhanced Chemical Vapor Deposition) loading and unloading machine and method
  • Full-automatic tubular PECVD (Plasma Enhanced Chemical Vapor Deposition) loading and unloading machine and method

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Embodiment Construction

[0029] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. The components of the embodiments of the invention generally described and illustrated in the figures herein may be arranged and designed in a variety of different configurations. Accordingly, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely represents selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without making creative efforts belong to the protection scope of the present invention.

[0030] Such as Figure 1 to Figure 3 ...

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Abstract

The invention discloses a full-automatic tubular PECVD (Plasma Enhanced Chemical Vapor Deposition) loading and unloading machine and method. The full-automatic tubular PECVD loading and unloading machine comprises a cabinet, as well as an automatic basket changing device, a chip arrangement buffer device, a manipulator and a graphite boat transport device mounted on the cabinet, wherein the automatic basket changing device is mounted on one side of the chip arrangement buffer device, the graphite boat transport device is mounted on the other side of the chip arrangement buffer device, the manipulator is mounted on one side of the chip arrangement buffer device and the graphite boat transport device, and the full-automatic tubular PECVD loading and unloading machine further comprises a basket for placing silicon chips and a graphite boat. The full-automatic tubular PECVD loading and unloading machine can automatically realize replacement and assembly of silicon chips between the basket and the graphite boat, is high in working efficiency and high in automation degree, and can reduce the fragmentation rate.

Description

technical field [0001] The invention relates to a solar cell manufacturing equipment, in particular to a fully automatic tubular PECVD loading and unloading machine and method. Background technique [0002] At present, the solar cell manufacturing process includes multiple processes, such as silicon wafer cleaning, texturing, diffusion, coating, marking, etc. In the above-mentioned processes, silicon wafers need to be loaded into baskets, graphite boats, and graphite boats. Mutual replacement of silicon wafers between baskets. In the prior art, it is customary to use manual loading or semi-automatic wafer replacement. This method is prone to problems such as high fragmentation rate, large pollution to silicon wafers, and low efficiency. Contents of the invention [0003] The object of the present invention is to provide a fully automatic tubular PECVD loading and unloading machine that can automatically replace and load silicon wafers between the basket and the graphite b...

Claims

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Application Information

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IPC IPC(8): H01L21/677H01J37/32
CPCH01J37/32743H01J37/32788H01L21/67745H01L21/6776H01L21/67775H01L21/67781
Inventor 梁明刚
Owner 广东启天自动化智能装备股份有限公司