Sputtering device component with modified surface and method of making
A technology of sputtering and sputtering targets, which is applied in the field of particle traps and its preparation, and can solve problems such as damage to film performance and falling into
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example 1 and 2
[0054] In two examples, titanium sputtering target assemblies were formed having particle trap features surrounding the sputtering surface. In a first step, the sputtering target is subjected to CNC lathe processing, which forms surface roughness with a macrostructure on the surface of the sides of the sputtering target to form particle traps. The height of the macrostructure of the surface above the sides of the sputter target after applying CNC lathing is shown in Table 1 below. The macrostructure is then subjected to a sandblasting step to add the microstructure to the macrostructure. The overall height of roughness including macrostructure and microstructure after the blasting step is shown in Table 1 below. Finally, sputtering target with dilute HF / HNO 3 Solution processing for final chemical processing steps. Multiple samples with different roughness values were prepared for each example. Tables 1 and 2 contain the height values of the surface roughness of the su...
example 3
[0064] In a third example, the method disclosed above was performed on a sample Ti target and an image was provided to show the location of the measurement and show certain features. Such as Figure 9 As shown in , the surface of a particle trap may contain surface roughness characterized by macrostructures 300 defined as the overall configuration of the surface. The macrostructure can be measured as having a height 310, also referred to as a profile above the surface. For example, the macrostructure may define valleys 304 or troughs for depressions, and peaks 302 or vertices for protrusions. A height 310 of macroscopic roughness Ra is measured from the bottom of valley 304 to the top of peak 302 . Thus, macrostructure 300 is measured over a surface area large enough to contain at least one repeating unit of the macrostructure, such as over an area that includes both valleys 304 and peaks 302 . Such as Figure 9 As shown in , localized regions 320 of the surface may be rel...
example 4
[0072] In a fourth embodiment, particle traps were formed on the sides of the sputter target using the method disclosed above. obtained from FEI using TM (Hillsboro, OR) scanning electron microscope images of particle traps at different magnifications. Photographs of particle traps used to form Figures 13A-13C , 14A-14C and 15A-15C.
[0073] Figure 13A A sputtering target surface that has been machined by a CNC lathe for surface treatment is shown at a first magnification. CNC lathing creates protrusions 380 that constitute macrostructures on the sides of the sputter target and form particle traps with surface roughness. Such as Figure 13A As shown in , macrostructure-forming protrusions 380 protrude from the surface of the sputtering target and form an overall surface profile having a first height. From Figure 13A The protrusions appearing in the range are about 1100 μm apart. The protrusions 380 form parallel lines to each other when viewed relative to the plane ...
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