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Preparation method of spongy porous silicon-dioxide nanosheet

A technology of porous silica and silica, applied in chemical instruments and methods, nanotechnology, nanotechnology, etc., can solve the problems of complex preparation methods and toxicity, achieve simple and controllable processes, enhance physical bonding, and achieve sustainable development. Unleash the effect of behavior improvements

Pending Publication Date: 2017-08-18
NANJING UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Mesoporous SiO is the main drug molecule carrier currently used. 2 Nanoparticles, mesoporous SiO in reported literature (MesoporousSilica Nanoparticle Nanocarriers: Biofunctionality and Biocompatibility.Acc.Chem.Res.2013,46:792-801.) 2 Nanoparticles need to be surface modified, the preparation method is relatively complicated, the molecular loading rate is only up to 5%, and it is toxic

Method used

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  • Preparation method of spongy porous silicon-dioxide nanosheet
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  • Preparation method of spongy porous silicon-dioxide nanosheet

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preparation example Construction

[0031] see figure 1 As shown, the preparation method of the spongy porous silicon dioxide nanosheet of the present invention comprises the following steps: 1) preparing a silicon dioxide film on a silicon wafer to obtain a silicon wafer with a silicon dioxide film.

[0032] In step 1), a silicon dioxide film is prepared on a silicon wafer by magnetron sputtering. Using magnetron sputtering to prepare a silicon dioxide film on a silicon wafer, the thickness of the prepared silicon dioxide film is more controllable and more uniform.

[0033] In step 1), preparing silicon dioxide film on silicon wafer by magnetron sputtering method comprises the following steps:

[0034] 1. Take a silicon wafer polished on one side and clean it; wherein, the crystal orientation of the silicon wafer is [001].

[0035] 2. Using a silicon dioxide target to perform magnetron sputtering to obtain a silicon wafer with a silicon dioxide film. Preferably, the purity of the silicon dioxide target is gr...

Embodiment 1

[0043] Step 1: Prepare SiO with a thickness of 200 nm on a silicon (Si) wafer by magnetron sputtering 2 film. Specifically include the following steps:

[0044] Step 1.1: Take a Si wafer with a diameter of 6 inches and a crystal orientation of (001) polished on one side, clean it, and spin dry it.

[0045] Step 1.2: Use 99.99% pure SiO 2 The target is sputtered in an argon atmosphere to obtain SiO 2 film.

[0046] Step 1.3: For convenience, the surface was sputtered with SiO 2The silicon wafer of the thin film is cut into small pieces of 2cm×2cm for later use.

[0047] Step 2: Preparation of sponge-like porous SiO using hydrothermal method 2 Nanosheets. Specifically include the following steps:

[0048] Step 2.1: Prepare NaBH with a concentration of 0.1g / ml 4 solution.

[0049] Step 2.2: Take 2ml NaBH 4 The solution was placed in a steel autoclave lined with polytetrafluoroethylene with a capacity of 20ml, and the cut pieces were immersed in it, and allowed to react...

Embodiment 2

[0053] Similar to Example 1, the difference is that the NaBH in the step 2.1 of Example 1 4 The concentration of the solution was changed to 1g / ml, and the reaction time was 2h. Other conditions remained the same.

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Abstract

The invention discloses a preparation method of a spongy porous silicon-dioxide nanosheet. The preparation method of the spongy and porous silicon-dioxide nanosheet adopts a hydrothermal method to prepare a spongy and porous silicon-dioxide film, the process is simple and controllable, the prepared spongy SiO2 nanosheet is in a porous form with the size of hundreds of nanometers and adsorbed molecules easily enters the prepared spongy SiO2 nanosheet; the spongy porous silicon-dioxide nanosheet has an ultrathin nanosheet form, and in the process of absorbing molecules, the form can be correspondingly changed along with the absorbing process so as to provide an effective capture; the spongy and porous SiO2 nanosheet has surface activity, so that the physical bonding among the molecules is enhanced, and further the continuous release behavior of wrapping molecules is greatly improved. In the preparation process, no surfactant is used, so that the toxicity risk caused by the surfactant is avoided.

Description

technical field [0001] The invention belongs to the field of photoelectric detection sensors, and in particular relates to a method for preparing a sponge-like porous silicon dioxide nanosheet. Background technique [0002] With the development of modern science and technology, people are committed to studying the encapsulation or immobilization of different guest atoms, molecules, and nanostructures and ensuring the integration of their respective functions. Create new systems in the field of catalytic reactions. To obtain controllable capsules with the advantages of effective binding, large loading capacity, and excellent performance at the same time depends largely on the structural parameters of the pores. Therefore, exploring novel porous-based materials remains a challenging research area. In particular, the growing demand for more efficient drug delivery systems has greatly promoted the development of new porous-based materials to achieve the purpose of controlling ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/10B01J20/28B01J20/30B82Y40/00B82Y30/00
CPCB01J20/103B82Y30/00B82Y40/00B01J20/28004B01J2220/4806
Inventor 吉庆敏孙姣
Owner NANJING UNIV OF SCI & TECH
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