3 results about "Porous morphology" patented technology

This application provides a high specific surface area, high tap density small-particle ternary precursor, its preparation method, cathode material, and lithium-ion battery, relating to the field of lithium-ion batteries. It includes a core and a first coating layer and a second coating layer sequentially disposed on the surface of the core; the core is a secondary particle formed by the stacking of multiple primary particles; the first and second coating layers are each independently formed by alternating layers of sheet-like primary particles; the sheet-like primary particles of the first coating layer are shorter than those of the second coating layer. The high specific surface area, high tap density small-particle ternary precursor exhibits a porous morphology with a loose interior and a relatively dense exterior, increasing porosity and specific surface area. Simultaneously, the relatively dense surface structure improves the tap density of the precursor. This morphology, when sintered into a cathode material, is beneficial for lithium-ion electron transport.

The application provides a silicon-on-insulator structure and a forming method thereof, and the forming method of the silicon-on-insulator structure increases the room-temperature bonding strength during a bonding process through an activation treatment, reduces the temperature required in a subsequent reinforcement process, thereby reducing the thermal diffusion of heterogeneous components in the etching stop layer, ensuring the clear interface between the etching stop layer and a device layer, and further avoiding the deterioration of the thickness uniformity of the device layer after the etching stop layer is removed in the subsequent process; the uniformity of the device layer after etching is controlled through two selective etching processes, so that the thickness uniformity of the device layer of the finally obtained silicon-on-insulator structure is less than 10%; and the formation and removal of a sacrificial oxide layer make the surface of the device layer not have a porous morphology of high-frequency etching undulation.

This invention provides a porous cathode precursor, a composite cathode material, its preparation method, and its application. The preparation method of the porous cathode precursor includes the following steps: co-precipitating a ternary mixed metal salt solution, a complexing agent solution containing citrate, a precipitant solution, and an oxidant solution into a reaction substrate to obtain a half-step precursor material; and pre-sintering the half-step precursor material to obtain the porous cathode precursor. The cathode precursor prepared by the method provided by this invention has a hollow porous morphology, which is beneficial for improving the cycle performance and rate performance of the ternary cathode material.