A hot wire chemical vapor deposition equipment

Abstract

The invention belongs to the field of chemical vapor deposition and discloses hot-filament chemical vapor deposition equipment. The equipment comprises a reaction cavity and a supporting platform, wherein an upper cover of the cavity adopts a flipping-type structure; two flipping-type observation windows are formed in the periphery of the cavity; parts in the cavity comprise a metal hot filament, a hot filament rack, a spring tension device, a hot filament electrode, a molybdenum plate base, an gas inlet and a gas exhaust port; the hot filament rack adopts a double-layer structure and is connected with the spring tension device, so that the metal hot filament is kept being tensioned; the reaction cavity is welded with five cooling water channels which are distributed on a cover plate, the upper part of the side wall of the cavity, the lower part of the outer wall of the cavity, a spring device connection block and a lower bottom plate; cooling water is introduced to the cooling water channels to be used for taking away heat produced in a deposition experiment; the supporting platform is a carrier of the reaction cavity. With the adoption of the hot-filament chemical vapor deposition equipment, the convenience and the safety of the hot-filament chemical vapor deposition process are improved, and the deposition efficiency of the equipment is improved.

Description

technical field [0001] The invention belongs to the field of chemical vapor deposition, and more specifically relates to a hot wire chemical vapor deposition equipment. Background technique [0002] The hot wire chemical vapor deposition method is a method of using gaseous reactants as raw materials to deposit thin films on the surface of substrate materials through the action of high temperature metal hot wires. This method has mature technology, simple equipment, low cost and good deposition effect. Very suitable for the deposition of diamond thin films. [0003] Due to the importance of the chemical vapor deposition method, there are many patents for chemical vapor deposition equipment that have been applied for. For example, the Chinese patent CN102181845A authorized and announced on September 14, 2011 discloses a chemical vapor deposition furnace, which includes a furnace body, a furnace body lifting mechanism and a furnace cover lifting mechanism, which are divided in...

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Problems solved by technology

[0004] In view of the above defects or improvement needs of the prior art, the present invention provides a hot wire chemical vapor deposition equipment, through the design inside the reaction chamber, thereby solving the unsafe way of opening the furnace, improper clamping of the metal hot wire and cooling cycle Technical issues with poor system performance

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