Closed substrate loading and unloading system for coating machine

A closed, coating machine technology, applied in the direction of conveyor objects, transportation and packaging, can solve the problems of high labor intensity of workers, uneven product quality, and contaminated substrates, to avoid contamination, reduce contamination, The effect of reducing labor intensity

Active Publication Date: 2018-01-05
广东腾胜科技创新有限公司
View PDF7 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These two processes lead to high labor intensity for the staff, and the hands of the staff will touch the substrate, resulting in fingerprints on the substrate, which will cause the substrate to be polluted. Before and after coating, the substrate will be polluted, resulting in product quality varies

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Closed substrate loading and unloading system for coating machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] The present invention will be further described in detail in conjunction with the accompanying drawings and specific embodiments.

[0018] In order to facilitate a unified review of the various reference signs in the drawings of the specification, the unified description of the reference signs appearing in the drawings of the specification is as follows:

[0019] 1 is the shell, 2 is the substrate transfer mechanism, 3 is the clamp transfer mechanism, 4 is the discharge mechanism, 5 is the jacking cylinder, 6 is the discharge table, 7 is the discharge port, 8 is the feed port, 9 is a feeding mechanism, 10 is a substrate identification mechanism, 11 is a circle identification mechanism, 12 is a manipulator, 13 is a telescopic cylinder, 14 is a receiving frame, 15 is a square substrate storage rack, and 16 is a circular substrate storage rack.

[0020] For the convenience of description, the up, down, left, and right directions mentioned below are the same as figure 1 Th...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a closed substrate loading and unloading system for a coating machine, which comprises a housing and a substrate transfer mechanism, a clamp transfer mechanism, an unloading mechanism, a loading mechanism, a substrate recognition mechanism, a radius recognition mechanism, a manipulator, a receiving mechanism, a square substrate storage rack, and a circular substrate storage frame inside the housing. The loading mechanism, the substrate recognition mechanism, the square recognition mechanism for recognizing the shape of the clamp, a manipulator for gripping the clamp, the receiving mechanism for loading the clamp, the square substrate storage rack for storing square substrates, and the circular substrate storage rack for storing circular substrates are arranged in order. The substrate transfer mechanism and the clamp transfer mechanism are located above the receiving mechanism. The housing has an inlet and an outlet, the loading mechanism is located at the inlet, and the unloading mechanism is located at the outlet. The closed substrate loading and unloading system can realize the automatic clamping and unloading of the substrates and belongs to the technical field of the loading and unloading of substrates.

Description

technical field [0001] The invention relates to the technical field of substrate loading and unloading, in particular to a closed loading and unloading system for a coating machine. Background technique [0002] When coating the substrate, the substrate needs to be placed on the jig, and then the jig is placed on the coating machine, and the coating machine coats the substrate. Currently, the two processes of clamping the substrate on the jig and unloading the substrate from the jig are generally done manually. These two processes lead to high labor intensity for the staff, and the hands of the staff will touch the substrate, resulting in fingerprints on the substrate, which will cause the substrate to be polluted. Before and after coating, the substrate will be polluted, resulting in product contamination. Quality varies. Contents of the invention [0003] In view of the technical problems existing in the prior art, the object of the present invention is to provide a cl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B65G47/91
Inventor 朱刚劲朱刚毅朱文廓
Owner 广东腾胜科技创新有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products