QIGA(quantum inspired genetic algorithm)-based discretized film system design method of broadband EUV (extreme ultraviolet) multilayer film

A design method and film system design technology, applied in gene models, genetic rules, optics, etc., to achieve the effect of increasing diversity, good population diversity characteristics, high solution efficiency and accuracy

Active Publication Date: 2018-02-09
CHANGCHUN UNIV OF SCI & TECH
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Problems solved by technology

However, in general sputtering technology, such as magnetron sputtering technology, the deposition rate is relatively high, and it is difficult to achieve high-precision deposition of film thickness through time control alone. Generally, the film thickness that can be precisely plated is based on the deposition rate as the tolerance. A series of discretized film thicknesses

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  • QIGA(quantum inspired genetic algorithm)-based discretized film system design method of broadband EUV (extreme ultraviolet) multilayer film
  • QIGA(quantum inspired genetic algorithm)-based discretized film system design method of broadband EUV (extreme ultraviolet) multilayer film
  • QIGA(quantum inspired genetic algorithm)-based discretized film system design method of broadband EUV (extreme ultraviolet) multilayer film

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application example 1

[0112] Application Example 1: Application of QIGA to the design of wide-angle Mo / Si multilayer films. image 3 A comparison of the solution efficiency of the design of wide-angle Mo / Si multilayer films based on EA, GA and QIGA is given. The results show that: GA has a "premature" phenomenon, and it falls into a local extremum, which leads to the lowest solution accuracy of the algorithm. The convergence speed of EA finds the global optimal solution in about 500 generations, while QIGA finds the global extremum in about 400 generations. At the same time, the solution accuracy of EA is lower than that of QIGA. The above results show that because QIGA uses qubits to encode chromosomes, one chromosome can represent the superposition of multiple states, thereby increasing the diversity of the population, and performing adaptive mutation through quantum revolving doors, improving the convergence speed and solution accuracy of the algorithm . Figure 4 The reflectance spectra inve...

application example 2

[0114] Application example 2: Design of wide-spectrum Mo / Si multilayer film using QIGA. Firstly, a comparative graph of the solution efficiency of the discretization design of wide-spectrum Mo / Si multilayer films based on EA, GA and QIGA is drawn, as shown in Figure 9 shown. Comparative analysis shows that the solution accuracy of GA is much lower than that of QIGA, and the phenomenon of "stagnation" appears in 100 generations. However, the solution efficiency and solution accuracy of EA are not as high as those of QIGA. In order to further prove that the multilayer film designed based on QIGA has superior spectral performance, the comparison of the reflectance spectra obtained by the optimal solution inversion after 4500 generations of design evolution of the wide-spectrum Mo / Si multilayer film based on QIGA, EA and GA is drawn. Figure, such as Figure 10 shown. The reflectance spectrum based on GA inversion has a narrow bandwidth and large fluctuation, which deviates gr...

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Abstract

The present invention discloses a QIGA(quantum inspired genetic algorithm)-based discretized film system design method of a broadband EUV (extreme ultraviolet) multilayer film. The method comprises the following steps that: 1) the initial parameter values of the design method are inputted; and 2) quantum encoding is performed on the film layer deposition time of the multilayer film, so that an initial quantum group Q (t) can be generated; (3) observation states R (t) of quantum superposition states are constructed according to the quantum probability amplitude of the individuals in the initial quantum group Q (t); (4) whether a termination condition is satisfied is judged, if the termination condition is satisfied, the method stops and outputs an optimal solution, otherwise, the method continues; (5) the fitness of individuals in the R (t), which characterizes the deposition time of a discretized film system, is calculated, individuals corresponding the optimal deposition time of thefilm system are saved; (6) a quantum rotation gate is updated, and the updated quantum rotation gate is adopted to update the Q (t); (7) the Q (t) is observed, R (t) is generated and is evaluated, optimal individuals are retained; (8) the Q (t) is updated through a quantum NOT gate; and (9) an elite retention strategy is adopted, and the method shifts to step (4). With the method of the inventionadopted, problems such as low solution efficiency and high requirement for thickness control precision during film coating of an existing EUV multilayer film design method can be solved.

Description

technical field [0001] The invention specifically relates to a discrete film system design method for a broadband extreme ultraviolet (EUV) multilayer film based on a quantum derived genetic algorithm (QIGA), and belongs to the field of EUV multilayer film research and development. Background technique [0002] Photolithography technology is the main process in the production of semiconductor industry today, and the reflective mirror based on extreme ultraviolet (EUV) multilayer film design is the most potential lithography technology—the core reflective element of EUV lithography technology. Since the EUV multilayer film can achieve high reflectivity in the EUV band, it is also widely used in many fields such as EUV astronomy, EUV spectroscopy, and synchrotron radiation. Therefore, the research and development of EUV multilayer film has attracted the attention of relevant people at home and abroad. At present, the extreme ultraviolet Mo / Si multilayer film can achieve a ref...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B27/00G06N3/12
CPCG02B27/0012G06N3/126
Inventor 匡尚奇张超
Owner CHANGCHUN UNIV OF SCI & TECH
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