Device for preparing functional film

Abstract

A device for preparing a functional film, comprising a cylindrical shell, a cover and a base, the cylindrical shell, the cover and the base are respectively connected together by screws to form an upper air chamber and a lower air chamber, the two sides of the cylindrical shell An observation window is installed, molybdenum sheet electrodes with micro-discharge holes, small ceramic sheets and molybdenum sheet electrodes are stacked sequentially from top to bottom, fixed on the cylindrical shell through large ceramic sheets, and molybdenum sheet electrodes are connected to the radio frequency power supply through wires Above, the upper part of the base is provided with a base plate anode, the lower part of the base plate anode is provided with a base plate support frame, and the upper part is provided with a substrate. A vacuum pump interface and an exhaust port are installed, and an air inlet is opened on the cover; the invention has the advantages of simple structure, convenient operation and high film forming rate.

Description

technical field [0001] The invention relates to the technical field of preparing functional thin films, in particular to a device for preparing functional thin films. Background technique [0002] Various types of functional films generally have high hardness, low coefficient of friction, transparency in the infrared region, good chemical inertness and biocompatibility, etc. It can not only be used as various protective layers, but also as a biological material coating, so it can Widely used in many fields such as machinery, optics, microelectronics and biomedicine. At present, the methods for preparing functional thin films mainly include three categories: electrochemical method, physical vapor deposition method and chemical vapor deposition method. These methods are relatively mature technologies, but they also have certain defects: either the equipment is expensive, or the structure is complex, Either the operating procedures are cumbersome, or the film formation rate is...

AI Technical Summary

Problems solved by technology

At present, the methods for preparing functional thin films mainly include three categories: electrochemical method, physical vapor deposition method and chemical vapor deposition method. These methods are relatively mature technologies, but they also have certain defects: either the equipment is expensive, or the structure is complex, Either the operating procedures are cumbersome, or the film formation rate is low, etc.

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