Solution bubble removal device and coating machine

A solution and bubble technology, used in devices for coating liquid on the surface, liquid degassing, liquid degassing by vibrating, etc., can solve problems such as inability to meet the needs of industrialized mass production, deviation of PI solid content, abnormal film thickness, etc. , to reduce the defoaming time, control volatilization, and improve the efficiency of use

Inactive Publication Date: 2018-03-06
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF6 Cites 11 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] At present, the commonly used methods to remove air bubbles in PI solution are: put the PI solution in a vacuum environment and keep vacuuming; but continuous vacuuming will cause the low boiling point organic solvent NMP (N-methylpyrrolidone) in the PI solution to volatilize and appear PI solid content deviation, abnormal film thickness, etc.; there is another method of continuously mechanically stirring the PI liquid for 16-18 hours, and passing clean nitrogen with bubbles, but this method takes a long time and cannot adapt to industrial quantities. production demand

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Solution bubble removal device and coating machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] The present invention will be described in further detail below in conjunction with the accompanying drawings and embodiments.

[0020] Such as figure 1 As shown, the present invention discloses a device for removing air bubbles of a polyimide solution, which device includes a first tank body 1, a second tank body 2 arranged in the first tank body 1 and a second tank body located in the first tank body 1 The ultrasonic generator 3 on the top, the first tank 1 is used to load the intermediate medium, such as water, etc., the second tank 2 is used for degassing, reprinting the polyimide solution, the first tank 1 and the second tank 2 The shape of the tank can be a cylindrical structure, and the first tank body 1 is placed vertically, which can save space.

[0021] The volume of the second tank body 2 is smaller than that of the first tank body 1, and the first tank body 1 and the second tank body 2 respectively form two first chambers 11 and second chambers 21 which are...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a bubble removal device for a polyimide solution. The device comprises a first tank, a second tank and an ultrasonic generator, wherein the second tank is arranged in the firsttank; the ultrasonic generator is arranged on the first tank; the volume of the second tank is smaller than that of the first tank; a first containing chamber and a second containing chamber which arenot connected with each other are respectively formed in the first tank and the second tank; the first containing chamber is filled with water; the second containing chamber is filled with a solution; and a liquid outlet pipe, a liquid inlet pipe and an exhaust pipe communicated with the second containing chamber are respectively arranged on the second tank. The invention further provides a coating machine. The coating machine comprises the bubble removal device for the polyimide solution, wherein the liquid outlet pipe is connected with a solution pipeline of a coating nozzle; and the liquidinlet pipe is connected with a storage tank. Compared with the prior art, the bubble removal device for the polyimide solution is capable of removing bubbles in the polyimide solution, so that the bubble removal time can be shortened, and time needed by the process is greatly reduced.

Description

technical field [0001] The invention relates to a display panel production technology, in particular to a solution bubble removal device and a coating machine. Background technique [0002] A flexible display is a display device based on a flexible substrate. Since the flexible display device has the characteristics of rollability, wide viewing angle, and portability, it has broad application prospects and good market potential. At present, the substrate materials that can be used for flexible display include ultra-thin glass, plastic film and metal foil. [0003] Polyimide (PI) is a kind of polymer with imide repeating unit, which has the advantages of wide application temperature, chemical corrosion resistance, high strength and high insulation. As a special engineering material, PI has been widely used in aviation, aerospace, microelectronics and other fields. At present, PI as a flexible substrate material has been successfully applied to some flexible display electro...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B01D19/02B05C11/10
CPCB01D19/02B05C11/10B01D19/0063B01D19/0078B05C5/0254B05C11/1007B01D19/0042
Inventor 郑颖
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products