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Sensor assembly and method of determining respective positions of multiple mirrors of a lithography system

A sensor and mirror technology, applied in the field of lithography equipment, can solve the problem that the voltage signal is easily affected by noise

Active Publication Date: 2021-05-11
CARL ZEISS SMT GMBH
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Problems solved by technology

This type of optical encoder supplies low voltage signals that are phase shifted by 90° relative to each other and are also called A and B signals, but these phase shifted voltage signals are susceptible to noise

Method used

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  • Sensor assembly and method of determining respective positions of multiple mirrors of a lithography system
  • Sensor assembly and method of determining respective positions of multiple mirrors of a lithography system
  • Sensor assembly and method of determining respective positions of multiple mirrors of a lithography system

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Embodiment Construction

[0086] In the figures, identical elements or elements with the same function are provided with the same reference signs, but not with any other. It should also be noted that the illustrations in the drawings are not necessarily to scale.

[0087] figure 1 A schematic view of an EUV lithographic apparatus 100A comprising a beam shaping and illumination system 102 and a projection system 104 is shown. EUV stands for "extreme ultraviolet" and corresponds to wavelengths of working light between 0.1 and 30 nm. The beam shaping and illumination system 102 and the projection system 104 are respectively arranged in vacuum enclosures, each of which is evacuated by means of an evacuation device, which is not specifically shown. The vacuum envelope is surrounded by a mechanical chamber, not shown in detail. Electrical controls and the like may also be located in the machine room.

[0088] The EUV lithographic apparatus 100A includes an EUV light source 106A. A plasma source or a syn...

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Abstract

The invention relates to a sensor assembly for determining the respective positions of a plurality of mirrors (M1-M6) of a lithographic system (100), comprising: a plurality of position sensor devices (140), wherein each position sensor device (140) comprises a measuring unit (201), light source (203), detection unit (204) and signal processing unit (207), wherein the measurement unit (201) provides an optical measure of the position of the mirror (M1‑M6) when illuminated by the beam position signal; the light source (203) illuminates the measurement unit (201) with a light beam; the detection unit (204) has a plurality of photodetectors (205) that output analog electrical position signals by detecting the provided optical position signal; and the The signal processing unit (207) has at least one A / D converter (208) converting said analog electrical position signal into a digital electrical position signal, wherein at least a light source (203) is provided in an integrated component arranged in a vacuum enclosure (137) ) and a signal processing unit (207); and an evaluation device (304), which determines the position of the mirror (M1-M6) by means of said digital electrical position signal.

Description

technical field [0001] The invention relates to a sensor arrangement and a method for determining the respective positions of a plurality of mirrors of a lithographic apparatus, a projection system of a lithographic apparatus, and a lithographic apparatus. The sensor arrangement comprises at least one position sensor device which provides a position signal of the mirror, and an evaluation device which determines the position of the mirror from the position signal. [0002] The priority application DE 10 2015 209 078.7 is hereby incorporated by reference in its entirety. Background technique [0003] Microlithography is used to manufacture microstructured components, such as integrated circuits. The microlithographic process is performed by a lithographic apparatus having an illumination system and a projection system. A mask (reticle) is illuminated by an illumination system, in which case an image of this mask is projected by a projection system onto a substrate coated wi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G01B11/14
CPCG03F7/70825G03F7/7085G01B11/026G03F7/70258G01B11/002
Inventor J.霍恩S.克朗L.伯杰
Owner CARL ZEISS SMT GMBH
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